LIQUID PROCESSING APPARATUS AND LIQUID PROCESSING METHOD
Abstract:
A liquid processing apparatus includes: a stage; a cup that surrounds a substrate placed on the stage; a processing liquid supplier that supplies a processing liquid to the substrate; an exhaust port provided in the cup to exhaust the cup; an annular body provided inside the cup to surround the substrate and form a flow path for a gas flowing into the cup; a lifting mechanism that raises or lowers the annular body relative to the cup to perform a switching between a first state in which the annular body is located at a first relative height to perform a first exhaust and a second state in which the annular body is located at a second relative height to perform a second exhaust; and a drainage port that opens to an upstream side of the exhaust port in each of the first and second flow paths.
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