Invention Publication
- Patent Title: SEMICONDUCTOR PROCESS DEVICE
-
Application No.: US18184418Application Date: 2023-03-15
-
Publication No.: US20240047247A1Publication Date: 2024-02-08
- Inventor: Chansoo KANG , Daewon KANG , Sangki NAM , Jungmo YANG , Changsoon LIM , Sungho JANG , Jonghun PI , Youngil KANG , Yoonjae KIM , Ilwoo KIM , Jongmu KIM , Yongbeom PARK
- Applicant: SAMSUNG ELECTRONICS CO., LTD.
- Applicant Address: KR Suwon-si
- Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee: SAMSUNG ELECTRONICS CO., LTD.
- Current Assignee Address: KR Suwon-si
- Priority: KR 20220095874 2022.08.02
- Main IPC: H01L21/67
- IPC: H01L21/67 ; H01J37/32

Abstract:
A semiconductor process device includes a chamber housing defining an internal region and a plurality of electrostatic chucks within the internal region. The chamber housing includes a window, and a light collection unit including a first optical system and a second optical system located at different positions on the window. A plurality of first optical pickup units are connected to the first optical system, and a plurality of second optical pickup units are connected to the second optical system. A sensor includes a plurality of photodetectors that are configured to convert a first optical signal transmitted by the plurality of first optical pickup units and a second optical signal transmitted by the plurality of second optical pickup units into electrical signals. A processor is configured to generate a spatial image of the internal region of the chamber housing using the electrical signals output by the plurality of photodetectors, and determine a location at which an arc occurs in the internal region of the chamber housing based on the spatial image.
Information query
IPC分类: