Invention Publication
- Patent Title: NON-DESTRUCTIVE SEM-BASED DEPTH-PROFILING OF SAMPLES
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Application No.: US17947481Application Date: 2022-09-19
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Publication No.: US20240094150A1Publication Date: 2024-03-21
- Inventor: Dror Shemesh , Doron Girmonsky , Uri Hadar , Michal Eilon
- Applicant: APPLIED MATERIALS ISRAEL LTD.
- Applicant Address: IL Rehovot
- Assignee: APPLIED MATERIALS ISRAEL LTD.
- Current Assignee: APPLIED MATERIALS ISRAEL LTD.
- Current Assignee Address: IL Rehovot
- Main IPC: G01N23/2251
- IPC: G01N23/2251 ; H01J37/29

Abstract:
Disclosed herein is a computer-based method for non-destructive depth-profiling of samples. The method includes a measurement operation and a data analysis operation. The measurement operation includes, for each of a plurality of landing energies: (i) projecting an electron beam on a sample, which penetrates the sample to a respective depth determined by the landing energy, and (ii) sensing electrons returned from the sample, thereby obtaining a respective sensed electrons data set. The data analysis operation includes generating from the sensed electrons data sets a concentration map, which characterizing at least a vertical dimension of the sample.
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