公开(公告)号：US20240096591A1

公开(公告)日：2024-03-21

申请号：US18237854

申请日：2023-08-24

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Dror Shemesh ,  Doron Girmonsky ,  Uri Hadar ,  Michal Eilon

IPC: H01J37/26 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/265 ,  H01J37/244 ,  H01J37/28 ,  H01J2237/24475 ,  H01J2237/24495 ,  H01J2237/24507

Abstract: Disclosed herein is a system for non-destructive depth-profiling of samples. The system includes: (i) an electron beam (e-beam) source for projecting e-beams at each of a plurality of landing energies on an inspected sample; (ii) an electron sensor for obtaining a measured set of electron intensities pertaining to each of the landing energies; and (iii) processing circuitry for determining a set of structural parameters, which characterizes an internal geometry and/or a composition of the inspected sample, based on the measured set of electron intensities and taking into account reference data indicative of an intended design of the inspected sample.

公开(公告)号：US20240094150A1

公开(公告)日：2024-03-21

申请号：US17947481

申请日：2022-09-19

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Dror Shemesh ,  Doron Girmonsky ,  Uri Hadar ,  Michal Eilon

IPC: G01N23/2251 ,  H01J37/29

CPC classification number: G01N23/2251 ,  H01J37/292 ,  G01N2223/053 ,  G01N2223/305 ,  G01N2223/306 ,  H01J2237/22 ,  H01J2237/2815

Abstract: Disclosed herein is a computer-based method for non-destructive depth-profiling of samples. The method includes a measurement operation and a data analysis operation. The measurement operation includes, for each of a plurality of landing energies: (i) projecting an electron beam on a sample, which penetrates the sample to a respective depth determined by the landing energy, and (ii) sensing electrons returned from the sample, thereby obtaining a respective sensed electrons data set. The data analysis operation includes generating from the sensed electrons data sets a concentration map, which characterizing at least a vertical dimension of the sample.

公开(公告)号：US20240085351A1

公开(公告)日：2024-03-14

申请号：US18231567

申请日：2023-08-08

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Doron Girmonsky ,  Michal Eilon ,  Dror Shemesh ,  Uri Hadar

IPC: G01N23/083 ,  G06T7/00

CPC classification number: G01N23/083 ,  G06T7/001 ,  G06T2207/10116 ,  G06T2207/20084

Abstract: Disclosed herein is a system for non-destructive depth-profiling of samples. The system includes an electron beam source, a light sensor, and processing circuitry. The electron beam source configured to project e-beams on an inspected sample at each of a plurality of landing energies, which induce X-ray emitting interactions within each of a plurality of probed regions in the inspected sample, respectively, whose depth is determined by the landing energy. The light sensor is configured to measure the emitted X-ray light to obtain optical emission data sets pertaining to each of the probed regions, respectively. The processing circuitry is configured to determine a set of structural parameters, characterizing an internal geometry and/or a composition of the inspected sample, based on the measured optical emission data sets and taking into account reference data indicative of an intended design of the inspected sample.

公开(公告)号：US20240255449A1

公开(公告)日：2024-08-01

申请号：US18103238

申请日：2023-01-30

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Doron Girmonsky ,  Uri Hadar ,  Dror Shemesh ,  Michal Eilon

IPC: G01N23/2252

CPC classification number: G01N23/2252 ,  G01N2223/079 ,  G01N2223/507 ,  G01N2223/6116

Abstract: Disclosed herein is a system for non-destructive classification of specimens. The system includes an e-beam source, an X-ray measurement module, and a computational module. The e-beam source is configured to project e-beams on a specimen at one or more e-beam landing energies, so as to penetrate the specimen and induce emission of X-rays. The X-ray measurement module is configured to measure the emitted X-rays. The computational module is configured to process the measurement data to obtain an energy signature of at least one target substance included in the specimen and classify the inspected specimen based on the obtained energy signature and one or more reference energy signatures pertaining to one or more reference specimens, respectively.

公开(公告)号：US20240085356A1

公开(公告)日：2024-03-14

申请号：US17901705

申请日：2022-09-01

Applicant: APPLIED MATERIALS ISRAEL LTD.

Inventor： Doron Girmonsky ,  Michal Eilon ,  Dror Shemesh ,  Uri Hadar

IPC: G01N23/2252 ,  G06N3/08

CPC classification number: G01N23/2252 ,  G06N3/08

Abstract: A computer-based method for non-destructive z-profiling of samples. The method includes: a measurement operation and a data analysis operation. The measurement operation includes, for each of a plurality of landing energies: (i) projecting an electron beam on a sample at a respective landing energy, such that light-emitting interactions between electrons from the electron beam and the sample occur within a respective probed region of the sample, which is centered about a respective depth; and (ii) measuring the emitted light to obtain an optical emission data set of the sample. The data analysis operation includes obtaining from the measured optical emission data sets a concentration map quantifying a dependence of a concentration of a material, which the sample comprises, on at least the depth.