发明公开
- 专利标题: SRAM with Improved Program and Sensing Margin for Scaled Nanosheet Devices
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申请号: US17949579申请日: 2022-09-21
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公开(公告)号: US20240098961A1公开(公告)日: 2024-03-21
- 发明人: Min Gyu Sung , Ruilong Xie , Heng Wu , Julien Frougier
- 申请人: International Business Machines Corporation
- 申请人地址: US NY Armonk
- 专利权人: International Business Machines Corporation
- 当前专利权人: International Business Machines Corporation
- 当前专利权人地址: US NY Armonk
- 主分类号: H01L27/11
- IPC分类号: H01L27/11
摘要:
An integrated circuit structure includes a memory cell and multiple transistors therein. The multiple transistors are formed using channels including a stack having alternating layers of conductive semiconductor material and layers of other material that are insulative. Two or more of the multiple transistors have a same number of layers of the conductive semiconductor material in corresponding channel regions but have different numbers of active layers and inactive layers of the conductive semiconductor material. An active layer is a layer forming a channel in the channel region that is electrically coupled to S/D regions in a corresponding transistor, while a floating layer is a layer in the channel region electrically isolated from the S/D regions in the corresponding transistor. Methods for forming the integrated circuit structure are disclosed.
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