Invention Publication
- Patent Title: HOLLOW PARTICLES
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Application No.: US18276745Application Date: 2022-02-18
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Publication No.: US20240109991A1Publication Date: 2024-04-04
- Inventor: Masashi Watanabe
- Applicant: ZEON CORPORATION
- Applicant Address: JP Tokyo
- Assignee: ZEON CORPORATION
- Current Assignee: ZEON CORPORATION
- Current Assignee Address: JP Tokyo
- Priority: JP 21029446 2021.02.26
- International Application: PCT/JP2022/006639 2022.02.18
- Date entered country: 2023-08-10
- Main IPC: C08F220/26
- IPC: C08F220/26

Abstract:
To provide hollow particles having a high void ratio and excellent pressure resistance. Hollow particles which comprise a shell containing a resin and a hollow portion surrounded by the shell, wherein a void ratio is 60% or more; wherein a volume average particle diameter is from 10 μm to 50 μm; wherein the shell contains, as the resin, a polymer in which from 70 parts by mass to 100 parts by mass of a crosslinkable monomer unit is contained in 100 parts by mass of all monomer units, and the crosslinkable monomer unit contains a bifunctional crosslinkable monomer unit derived from a bifunctional crosslinkable monomer and a trifunctional or higher-functional crosslinkable monomer unit derived from a trifunctional or higher-functional crosslinkable monomer; and wherein, when observed in plan view, a percentage of particles having a dent with a size of 5% to 50% of the particle diameter, is 10% or less.
Information query
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