Invention Publication

  • Patent Title: HOLLOW PARTICLES
  • Application No.: US18276745
    Application Date: 2022-02-18
  • Publication No.: US20240109991A1
    Publication Date: 2024-04-04
  • Inventor: Masashi Watanabe
  • Applicant: ZEON CORPORATION
  • Applicant Address: JP Tokyo
  • Assignee: ZEON CORPORATION
  • Current Assignee: ZEON CORPORATION
  • Current Assignee Address: JP Tokyo
  • Priority: JP 21029446 2021.02.26
  • International Application: PCT/JP2022/006639 2022.02.18
  • Date entered country: 2023-08-10
  • Main IPC: C08F220/26
  • IPC: C08F220/26
HOLLOW PARTICLES
Abstract:
To provide hollow particles having a high void ratio and excellent pressure resistance. Hollow particles which comprise a shell containing a resin and a hollow portion surrounded by the shell, wherein a void ratio is 60% or more; wherein a volume average particle diameter is from 10 μm to 50 μm; wherein the shell contains, as the resin, a polymer in which from 70 parts by mass to 100 parts by mass of a crosslinkable monomer unit is contained in 100 parts by mass of all monomer units, and the crosslinkable monomer unit contains a bifunctional crosslinkable monomer unit derived from a bifunctional crosslinkable monomer and a trifunctional or higher-functional crosslinkable monomer unit derived from a trifunctional or higher-functional crosslinkable monomer; and wherein, when observed in plan view, a percentage of particles having a dent with a size of 5% to 50% of the particle diameter, is 10% or less.
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