- 专利标题: WIDE BANDGAP TRANSISTOR LAYOUT WITH L-SHAPED GATE ELECTRODES
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申请号: US18370144申请日: 2023-09-19
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公开(公告)号: US20240113169A1公开(公告)日: 2024-04-04
- 发明人: Guillaume Alexandre Blin
- 申请人: SKYWORKS SOLUTIONS, INC.
- 申请人地址: US CA Irvine
- 专利权人: SKYWORKS SOLUTIONS, INC.
- 当前专利权人: SKYWORKS SOLUTIONS, INC.
- 当前专利权人地址: US CA Irvine
- 主分类号: H01L29/06
- IPC分类号: H01L29/06 ; H01L29/20 ; H01L29/417 ; H01L29/778
摘要:
A transistor comprising a first source region, a first drain region disposed on a first side of the first source region, a first active region being formed between the first source region and the first drain region, a second drain region disposed on a second side of the first source region, a second active region being formed between the first source region and the second drain region, directions of greatest extension of the first and second active regions being non-parallel, a first gate electrode finger disposed over the first active region, and a second gate electrode finger disposed over the second active region.
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