Invention Publication
- Patent Title: MANUFACTURING METHOD OF DISPLAY APPARATUS AND DISPLAY APPARATUS
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Application No.: US18373324Application Date: 2023-09-27
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Publication No.: US20240138183A1Publication Date: 2024-04-25
- Inventor: Yasutaka NAKAZAWA , Takayuki OHIDE , Naoto GOTO , Hiroki ADACHI , Satoru IDOJIRI , Hayato YAMAWAKI , Kenichi OKAZAKI , Sachiko KAWAKAMI
- Applicant: Semiconductor Energy Laboratory Co., Ltd.
- Applicant Address: JP Atsugi-shi
- Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee: Semiconductor Energy Laboratory Co., Ltd.
- Current Assignee Address: JP Atsugi-shi
- Priority: JP 22162233 2022.10.07
- Main IPC: H10K59/12
- IPC: H10K59/12 ; H10K59/122

Abstract:
A method for manufacturing a novel display apparatus is provided. The method includes a first step of forming a first electrode, a second electrode, and a first gap over an insulating film, a second step of forming a first film over the second electrode; a third step of forming a first layer overlapping with the first electrode, a fourth step of removing the first film by an etching method to form a first unit overlapping with the first electrode, a fifth step of removing a surface of the second electrode, a sixth step of forming a second film over the first layer and the second electrode, a seventh step of forming a second layer overlapping with the second electrode, and an eighth step of removing the second film by an etching method using the second layer to form a second unit overlapping with the second electrode and a second gap.
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