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公开(公告)号:US20190317624A1
公开(公告)日:2019-10-17
申请号:US16452615
申请日:2019-06-26
Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Inventor: Shunpei YAMAZAKI , Hajime KIMURA , Masami JINTYOU , Yasuharu HOSAKA , Naoto GOTO , Takahiro IGUCHI , Daisuke KUROSAKI , Junichi KOEZUKA
Abstract: A touch panel including an oxide semiconductor film having conductivity is provided. The touch panel includes a transistor, a second insulating film, and a touch sensor. The transistor includes a gate electrode; a gate insulating film; a first oxide semiconductor film; a source electrode and a drain electrode; a first insulating film; and a second oxide semiconductor film. The second insulating film is over the second oxide semiconductor film so that the second oxide semiconductor film is positioned between the first insulating film and the second insulating film. The touch sensor includes a first electrode and a second electrode. One of the first and second electrodes includes the second oxide semiconductor film.
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公开(公告)号:US20170358682A1
公开(公告)日:2017-12-14
申请号:US15610784
申请日:2017-06-01
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Naoto GOTO , Yasuharu HOSAKA , Mizuho YAGUCHI
IPC: H01L29/786 , H01L27/12 , H01L29/66
Abstract: A transistor with a small footprint is provided. A transistor having high reliability is provided. A transistor is provided over an insulating layer that has a projection. Over the projection, at least a channel formation region of a semiconductor layer is provided. This can reduce the footprint of the transistor. The transistor has a curved structure, which inhibits light that enters from the outside from reaching a channel formation region of the semiconductor layer. Accordingly, deterioration of the transistor due to external light can be reduced, whereby the transistor can have increased reliability. The projection can be obtained by utilizing the internal stress of the layer formed over the insulating layer. Alternatively, the projection can be obtained by placing, under the insulating layer, a structure body for providing the insulating layer with the projection.
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公开(公告)号:US20160049428A1
公开(公告)日:2016-02-18
申请号:US14926795
申请日:2015-10-29
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Daisuke KUBOTA , Ryo HATSUMI , Masami JINTYOU , Takumi SHIGENOBU , Naoto GOTO
IPC: H01L27/12 , H01L29/786 , H01L49/02
CPC classification number: H01L27/1255 , G02F1/13306 , G02F1/133305 , G02F1/133345 , G02F1/13338 , G02F1/133512 , G02F1/1339 , G02F1/1341 , G02F1/1343 , G02F1/136213 , G02F1/136286 , G02F1/1368 , G02F2001/133357 , G02F2001/13415 , G06F3/0412 , G06F3/044 , G06F2203/04108 , H01L27/1225 , H01L27/124 , H01L27/1248 , H01L27/127 , H01L28/60 , H01L29/24 , H01L29/41733 , H01L29/45 , H01L29/78633 , H01L29/7869 , H01L29/78696
Abstract: A semiconductor device having a high aperture ratio and including a capacitor capable of increasing the charge capacity is provided. A semiconductor device includes a transistor over a substrate, a first light-transmitting conductive film over the substrate, an oxide insulating film covering the transistor and having an opening over the first light-transmitting conductive film, a nitride insulating film over the oxide insulating film and in contact with the first light-transmitting conductive film in the opening, a second light-transmitting conductive film connected to the transistor and having a depressed portion in the opening, and an organic resin film with which the depressed portion of the second light-transmitting conductive film is filled.
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公开(公告)号:US20250017050A1
公开(公告)日:2025-01-09
申请号:US18709968
申请日:2022-11-08
Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Inventor: Masahiro KATAYAMA , Naoto GOTO , Kenichi OKAZAKI
IPC: H10K59/122 , H10K50/13 , H10K59/80
Abstract: A display device in which crosstalk is inhibited is provided. The display device includes a first insulating layer including a first region and a second region having a lower top surface level than the first region, a second insulating layer including a region overlapping with the first region, a light-emitting device including a region overlapping with the first region with the second insulating layer therebetween, a stack including a region overlapping with the second region, and a third insulating layer including a region overlapping with the stack; the second insulating layer includes a protruding portion overlapping with the second region; the light-emitting device includes at least a light-emitting layer, a first upper electrode over the light-emitting layer, and a second upper electrode over the first upper electrode; the second upper electrode includes a region overlapping with the third insulating layer; and the stack contains the same material as the light-emitting layer.
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公开(公告)号:US20250008818A1
公开(公告)日:2025-01-02
申请号:US18711284
申请日:2022-11-21
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Yukinori SHIMA , Kenichi OKAZAKI , Masataka NAKADA , Yasutaka NAKAZAWA , Naoto GOTO , Saki EGUCHI , Sachiko KATANIWA
Abstract: A display apparatus with extremely high resolution is provided. A display apparatus with high display quality is provided. The display apparatus includes a first light-emitting element and a second light-emitting element over a first insulating layer, a second insulating layer, and a third insulating layer. The first light-emitting element includes a first pixel electrode and a first organic layer. The second light-emitting element includes a second pixel electrode and a second organic layer. The first insulating layer includes a groove-like region provided along a side of the first pixel electrode in a plan view. The groove-like region includes a first region overlapping with the first pixel electrode and a second region overlapping with the second pixel electrode. The first region and the second region each have a width greater than or equal to 20 nm and less than or equal to 500 nm. The second insulating layer includes a region in contact with a top surface of the first organic layer, a region in contact with a side surface of the first organic layer, and a region located below the first pixel electrode. The third insulating layer includes a region in contact with a top surface of the second organic layer, a region in contact with a side surface of the second organic layer, and a region located below the second pixel electrode.
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公开(公告)号:US20240272735A1
公开(公告)日:2024-08-15
申请号:US18627619
申请日:2024-04-05
Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Inventor: Shunpei YAMAZAKI , Hajime KIMURA , Masami JINTYOU , Yasuharu HOSAKA , Naoto GOTO , Takahiro IGUCHI , Daisuke KUROSAKI , Junichi KOEZUKA
CPC classification number: G06F3/0412 , G06F3/0446 , H01L27/1222 , H01L27/1225 , H01L27/124 , H01L27/1255 , H01L29/24 , H01L29/66969 , H01L29/7869 , H01L29/78696 , H10K59/40 , G06F2203/04103
Abstract: A touch panel including an oxide semiconductor film having conductivity is provided. The touch panel includes a transistor, a second insulating film, and a touch sensor. The transistor includes a gate electrode; a gate insulating film; a first oxide semiconductor film; a source electrode and a drain electrode; a first insulating film; and a second oxide semiconductor film. The second insulating film is over the second oxide semiconductor film so that the second oxide semiconductor film is positioned between the first insulating film and the second insulating film. The touch sensor includes a first electrode and a second electrode. One of the first and second electrodes includes the second oxide semiconductor film.
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公开(公告)号:US20220320340A1
公开(公告)日:2022-10-06
申请号:US17629802
申请日:2020-07-27
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Naoto GOTO , Naoki IKEZAWA , Masataka NAKADA , Ami SATO , Chieko MISAWA
IPC: H01L29/786 , H01L29/66
Abstract: A semiconductor device with favorable electrical characteristics is provided. A highly reliable semiconductor device is provided. The semiconductor device includes a semiconductor layer, a first insulating layer over the semiconductor layer, and a conductive layer over the first insulating layer. The semiconductor layer includes a first region, a pair of second regions, a pair of third regions, and a pair of fourth regions. The second regions sandwich the first region, the third regions sandwich the first region and the second regions, and the fourth regions sandwich the first region, the second regions, and the third regions. The first region includes a region overlapping with the first insulating layer and the conductive layer, the second regions and the third regions each include a region overlapping with the first insulating layer and not overlapping with the conductive layer, and the fourth regions overlap with neither the first insulating layer nor the conductive layer. A thickness of the first insulating layer in regions overlapping with the second regions is substantially equal to a thickness of the first insulating layer in a region overlapping with the first region. A thickness of the first insulating layer in regions overlapping with the third regions is smaller than the thickness of the first insulating layer in the regions overlapping with the second regions.
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公开(公告)号:US20170271421A1
公开(公告)日:2017-09-21
申请号:US15456887
申请日:2017-03-13
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Yasuhiro JINBO , Kohei YOKOYAMA , Yuki TAMATSUKURI , Naoto GOTO , Masami JINTYOU , Masayoshi DOBASHI , Masataka NAKADA , Akihiro CHIDA , Naoyuki SENDA
IPC: H01L27/32
CPC classification number: H01L27/3258 , H01L51/5253 , H01L2251/301 , H01L2251/5338
Abstract: To provide a display device with a manufacturing yield and/or a display device with suppressed mixture of colors between adjacent pixels. The display device includes a first pixel electrode, a second pixel electrode, a first insulating layer, a second insulating layer, and an adhesive layer. The first insulating layer includes a first opening. The second insulating layer includes a second opening. The first opening and the second opening are provided between the first pixel electrode and the second pixel electrode. In a top view, a periphery of the second opening is positioned on an inner side than a periphery of the first opening. The adhesive layer has a region overlapping with the second insulating layer below the second insulating layer.
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公开(公告)号:US20240324279A1
公开(公告)日:2024-09-26
申请号:US18260969
申请日:2021-12-27
Applicant: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
Inventor: Shunpei YAMAZAKI , Kenichi OKAZAKI , Yuichi YANAGISAWA , Naoto GOTO , Shun MASHIRO
IPC: H10K59/12 , H10K59/122 , H10K71/20
CPC classification number: H10K59/1201 , H10K59/122 , H10K71/233
Abstract: A method of fabricating a display device with high resolution is provided. A display device having both high display quality and high resolution is provided. The method of fabricating a display device includes steps of forming a first EL film and a first sacrificial film over a first pixel electrode and a second pixel electrode; etching the first sacrificial film to form a first sacrificial layer; etching the first EL film to form a first EL layer and to expose the second pixel electrode; forming a second EL film and a second sacrificial film; etching the second sacrificial film to form a second sacrificial layer; etching the second EL film to form a second EL layer; forming an insulating film covering the first sacrificial layer, the first EL layer, the second sacrificial layer, and the second EL layer; and etching the insulating film to form an insulating layer including a region in contact with a side surface of the first EL layer and a region in contact with a side surface of the second EL layer.
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公开(公告)号:US20240138183A1
公开(公告)日:2024-04-25
申请号:US18373324
申请日:2023-09-27
Applicant: Semiconductor Energy Laboratory Co., Ltd.
Inventor: Yasutaka NAKAZAWA , Takayuki OHIDE , Naoto GOTO , Hiroki ADACHI , Satoru IDOJIRI , Hayato YAMAWAKI , Kenichi OKAZAKI , Sachiko KAWAKAMI
IPC: H10K59/12 , H10K59/122
CPC classification number: H10K59/1201 , H10K59/122 , H10K85/636
Abstract: A method for manufacturing a novel display apparatus is provided. The method includes a first step of forming a first electrode, a second electrode, and a first gap over an insulating film, a second step of forming a first film over the second electrode; a third step of forming a first layer overlapping with the first electrode, a fourth step of removing the first film by an etching method to form a first unit overlapping with the first electrode, a fifth step of removing a surface of the second electrode, a sixth step of forming a second film over the first layer and the second electrode, a seventh step of forming a second layer overlapping with the second electrode, and an eighth step of removing the second film by an etching method using the second layer to form a second unit overlapping with the second electrode and a second gap.
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