Invention Publication
- Patent Title: LASER ANNEALING METHOD AND METHOD OF MANUFACTURING DISPLAY DEVICE USING THE SAME
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Application No.: US18235797Application Date: 2023-08-18
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Publication No.: US20240145243A1Publication Date: 2024-05-02
- Inventor: CHEOLHO PARK , JEKIL RYU , JEONGHUN WOO , DOO-WON LEE , HAESOOK LEE , JIN HONG JEUN
- Applicant: SAMSUNG DISPLAY CO., LTD.
- Applicant Address: KR Yongin-si
- Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee: SAMSUNG DISPLAY CO., LTD.
- Current Assignee Address: KR Yongin-si
- Priority: KR 20220144422 2022.11.02
- Main IPC: H01L21/02
- IPC: H01L21/02

Abstract:
A laser annealing method includes selecting a reference intensity from a plurality of intensities of a plurality of peaks; where the reference intensity is used to determine a pulse shape of laser irradiation during laser annealing, setting the pulse shape by setting an intensity ratio of a first peak having a smallest peak occurrence time among the plurality of peaks to less than about 100 percent relative to the reference intensity, and irradiating a laser beam having the pulse shape to a stage.
Information query
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