公开(公告)号：US20240145243A1

公开(公告)日：2024-05-02

申请号：US18235797

申请日：2023-08-18

Applicant: SAMSUNG DISPLAY CO., LTD.

Inventor： CHEOLHO PARK ,  JEKIL RYU ,  JEONGHUN WOO ,  DOO-WON LEE ,  HAESOOK LEE ,  JIN HONG JEUN

IPC: H01L21/02

CPC classification number: H01L21/02686 ,  H01L21/02691 ,  H10K59/1201

Abstract: A laser annealing method includes selecting a reference intensity from a plurality of intensities of a plurality of peaks; where the reference intensity is used to determine a pulse shape of laser irradiation during laser annealing, setting the pulse shape by setting an intensity ratio of a first peak having a smallest peak occurrence time among the plurality of peaks to less than about 100 percent relative to the reference intensity, and irradiating a laser beam having the pulse shape to a stage.