- 专利标题: MANUFACTURING METHOD OF ELECTRONIC DEVICE
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申请号: US18446214申请日: 2023-08-08
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公开(公告)号: US20240145620A1公开(公告)日: 2024-05-02
- 发明人: Hironori FURUTA , Takuma ISHIKAWA , Yuuki SHINOHARA , Takahito SUZUKI , Kenichi TANIGAWA , Yutaka KITAJIMA
- 申请人: Oki Electric Industry Co., Ltd.
- 申请人地址: JP Tokyo
- 专利权人: Oki Electric Industry Co., Ltd.
- 当前专利权人: Oki Electric Industry Co., Ltd.
- 当前专利权人地址: JP Tokyo
- 优先权: JP 22171093 2022.10.26
- 主分类号: H01L31/18
- IPC分类号: H01L31/18 ; H10N30/03
摘要:
A manufacturing method of an electronic device includes forming a support layer that is provided to extend from a first surface of a functional layer formed on a first substrate via a first layer, as a surface on a side opposite to the first substrate, to the first substrate and supports the functional layer with respect to the first substrate, forming a thin film holding layer on at least one of the support layer and the first surface of the functional layer, removing the first layer, joining a transfer member to a surface of the thin film holding layer on a side opposite to the functional layer, separating the functional layer, the support layer and the thin film holding layer from the first substrate, transferring the functional layer, the support layer and the thin film holding layer to a different second substrate, and removing the thin film holding layer.
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