Invention Publication
- Patent Title: SEMICONDUCTOR PROCESS EQUIPMENT
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Application No.: US18141923Application Date: 2023-05-01
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Publication No.: US20240150888A1Publication Date: 2024-05-09
- Inventor: Bhaskar PRASAD , Kirankumar Neelasandra SAVANDAIAH , Thomas BREZOCZKY , Lakshmikanth Krishnamurthy SHIRAHATTI
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: C23C14/56
- IPC: C23C14/56 ; C23C14/35 ; H01F7/20 ; H01J37/32 ; H01L21/677

Abstract:
A substrate process station includes a housing including a transport region and process region. The process station further includes a magnetic levitation assembly disposed in the transport region configured to levitate and propel a substrate carrier. The magnetic levitation assembly includes a first track segment including first rails disposed in the transport region and below the process region, wherein the first rails each include a first plurality of magnets. The process station further includes a pedestal assembly comprising a pedestal disposed within the housing. The pedestal is moveable between a pedestal transfer position and a process position, wherein the pedestal is disposed between the first rails in the pedestal transfer position to receive a substrate from the substrate carrier, and wherein the pedestal is moveable between the first rails to position the received substrate in the process region in the process position.
Information query
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