• Patent Title: FABRICATION OF SLANTED GRATING MASTER AND WORKING STAMP USING GRAYSCALE LITHOGRAPHY AND PLASMA ETCHING
  • Application No.: US18489397
    Application Date: 2023-10-18
  • Publication No.: US20240168207A1
    Publication Date: 2024-05-23
  • Inventor: Lu TianWei JinThomas Mercier
  • Applicant: GOOGLE LLC
  • Applicant Address: US CA Mountain View
  • Assignee: GOOGLE LLC
  • Current Assignee: GOOGLE LLC
  • Current Assignee Address: US CA Mountain View
  • Main IPC: G02B5/18
  • IPC: G02B5/18 F21V8/00 G02B27/01
FABRICATION OF SLANTED GRATING MASTER AND WORKING STAMP USING GRAYSCALE LITHOGRAPHY AND PLASMA ETCHING
Abstract:
A method for fabricating a working stamp for forming slanted surface gratings in a waveguide workpiece includes providing a master workpiece comprising a substrate and performing a sequence of photoresist deposition processes, grayscale lithography processes, and etching processes on the master workpiece so as to form an imprint replication master having a pattern of slanted gratings in a working surface of its substrate, the slanted gratings having sidewalls that are not substantially orthogonal to a working surface of the substrate. The method also includes conforming a soft stamp material layer to the working surface of the imprint replication master so that the soft stamp material layer has a pattern of slanted protrusions corresponding to the pattern of slanted gratings, and removing the imprint replication master from the soft stamp material and curing the soft stamp material layer surrounding the pattern of slanted protrusions to form the working stamp.
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