Invention Publication
- Patent Title: ELECTRODE PLATE MANUFACTURING APPARATUS AND ELECTRODE PLATE MANUFACTURING METHOD
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Application No.: US18438393Application Date: 2024-02-09
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Publication No.: US20240178362A1Publication Date: 2024-05-30
- Inventor: Diwu LI , Hongwu SHANG , Shisong LI , Huan CHE , Zhenguang TANG , Linchen LIAO
- Applicant: CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED
- Applicant Address: CN Ningde
- Assignee: CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED
- Current Assignee: CONTEMPORARY AMPEREX TECHNOLOGY CO., LIMITED
- Current Assignee Address: CN Ningde
- Priority: CN 2111675817.5 2021.12.31
- Main IPC: H01M4/04
- IPC: H01M4/04 ; B05C9/04 ; B05C9/08

Abstract:
An electrode plate manufacturing apparatus includes a first coating device configured to apply a first active material coating on a first side of a current collector; a perforating device configured to perforate the current collector from a second side of the current collector, the second side being opposite to the first side; and a second coating device configured to apply a second active material coating on the second side of the current collector, where the perforating device is located downstream of the first coating device along a travel path of the current collector, and the second coating device is located downstream of the perforating device along the travel path of the current collector.
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