Invention Publication
- Patent Title: RESIST COMPOSITION AND PATTERN FORMING PROCESS
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Application No.: US18380970Application Date: 2023-10-17
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Publication No.: US20240192591A1Publication Date: 2024-06-13
- Inventor: Jun Hatakeyama , Takayuki Fujiwara
- Applicant: Shin-Etsu Chemical Co., Ltd.
- Applicant Address: JP Tokyo
- Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee: Shin-Etsu Chemical Co., Ltd.
- Current Assignee Address: JP Tokyo
- Priority: JP 22169784 2022.10.24
- Main IPC: G03F7/004
- IPC: G03F7/004 ; C08F216/02 ; C08F220/18 ; C08F220/22 ; C08F220/38 ; G03F7/039 ; G03F7/20
Abstract:
A resist composition comprising an acid generator containing a sulfonium salt containing a sulfonic acid anion having a carbon atom to which an iodine atom is bonded and a sulfonium cation having formula (1).
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