- 专利标题： ORGANIC SALT, PHOTORESIST COMPOSITION INCLUDING THE SAME, AND PATTERN FORMATION METHOD USING THE SAME
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申请号： US18192316申请日： 2023-03-29
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公开(公告)号： US20240201588A1公开(公告)日： 2024-06-20
- 发明人: Hana KIM , Beomseok KIM , Kyuhyun IM , Yoonhyun KWAK , Hyeran KIM
- 申请人： Samsung Electronics Co., Ltd.
- 申请人地址： KR Suwon-si
- 专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人： Samsung Electronics Co., Ltd.
- 当前专利权人地址： KR Suwon-si
- 优先权： KR 20220150966 2022.11.11
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; C07C65/10 ; C07C309/12 ; C07C311/09 ; C07C391/02 ; C07C395/00 ; G03F7/038 ; G03F7/039
摘要：
Provided are an organic salt represented by Formula 1, a photoresist composition including the same, and a pattern method using the same:
wherein X+, Y−, and R11 to R13 in Formula 1 are understood by referring to the specification.
wherein X+, Y−, and R11 to R13 in Formula 1 are understood by referring to the specification.
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