- 专利标题: LITHOGRAPHIC CAVITY FORMATION TO ENABLE EMIB BUMP PITCH SCALING
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申请号: US18622511申请日: 2024-03-29
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公开(公告)号: US20240243066A1公开(公告)日: 2024-07-18
- 发明人: Kristof DARMAWIKARTA , Hiroki TANAKA , Robert MAY , Sameer PAITAL , Bai NIE , Jesse JONES , Chung Kwang Christopher TAN
- 申请人: Intel Corporation
- 申请人地址: US CA Santa Clara
- 专利权人: Intel Corporation
- 当前专利权人: Intel Corporation
- 当前专利权人地址: US CA Santa Clara
- 主分类号: H01L23/538
- IPC分类号: H01L23/538 ; H01L23/00 ; H01L23/522
摘要:
Embodiments include an electronic package with an embedded multi-interconnect bridge (EMIB) and methods of making such packages. Embodiments include a first layer, that is an organic material and a second layer disposed over the first layer. In an embodiment, a cavity is formed through the second layer to expose a first surface of the first layer. A bridge substrate is in the cavity and is supported by the first surface of the first layer. Embodiments include a first die over the second layer that is electrically coupled to a first contact on the bridge substrate, and a second die over the second layer that is electrically coupled to a second contact on the bridge substrate. In an embodiment the first die is electrically coupled to the second die by the bridge substrate.
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