LITHOGRAPHIC PROCESSES FOR MAKING POLYMER-BASED ELEMENTS

    公开(公告)号:US20240184209A1

    公开(公告)日:2024-06-06

    申请号:US18060593

    申请日:2022-12-01

    CPC classification number: G03F7/201 G03F7/0007 G03F7/2006 G03F7/2014

    Abstract: The present disclosure is directed to a lithographic patterning system including a stage for supporting a substrate with a photo-definable polymer layer, a first actinic radiation source, which is configured to propagate light along a first optical axis, a first mask for patterning the propagated light from the first actinic radiation source, a second actinic radiation source, which is configured to propagate light along a second optical axis, and a second mask for patterning the propagated light from the second actinic radiation source. In a method, first and second propagated lights form an intersection in the photo-definable polymer layer, and a patterned semiconductor component is formed at the intersection.

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