- 专利标题: DESIGN TO FABRICATED LAYOUT CORRELATION
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申请号: US18408018申请日: 2024-01-09
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公开(公告)号: US20240249050A1公开(公告)日: 2024-07-25
- 发明人: Adam Kimura , Rohan Prabhu , Noah Mun
- 申请人: Battelle Memorial Institute
- 申请人地址: US OH Columbus
- 专利权人: Battelle Memorial Institute
- 当前专利权人: Battelle Memorial Institute
- 当前专利权人地址: US OH Columbus
- 主分类号: G06F30/327
- IPC分类号: G06F30/327 ; G06F30/27 ; G06F30/3308 ; G06F30/333 ; G06F30/367 ; G06F30/392 ; G06F30/398 ; G06F119/18 ; G06N3/08
摘要:
In an integrated circuit (IC) assessment method, an artificial intelligence (AI) component comprising at least one artificial neural network (ANN) is trained to transform layout rendering tiles of a rendering of a reference IC into corresponding reference layout image tiles extracted from at least one layout image of the reference IC. Using the trained AI component, standard cell layout renderings of a library of GDSII or OASIS standard cell layout renderings are transformed into as-fabricated standard cell layout renderings forming a library of as fabricated standard cell layout renderings. Instantiated standard cells and their placements in the layout image of an IC-under-test are identified by matching the instantiated standard cells with corresponding as-fabricated standard cell layout renderings retrieved from the library of as fabricated standard cell layout renderings.
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