DESIGN TO FABRICATED LAYOUT CORRELATION

    公开(公告)号:US20220188491A1

    公开(公告)日:2022-06-16

    申请号:US17545572

    申请日:2021-12-08

    摘要: In an integrated circuit (IC) assessment method, an artificial intelligence (AI) component comprising at least one artificial neural network (ANN) is trained to transform layout rendering tiles of a rendering of a reference IC into corresponding reference layout image tiles extracted from at least one layout image of the reference IC. Using the trained AI component, standard cell layout renderings of a library of GDSII or OASIS standard cell layout renderings are transformed into as-fabricated standard cell layout renderings forming a library of as fabricated standard cell layout renderings. Instantiated standard cells and their placements in the layout image of an IC-under-test are identified by matching the instantiated standard cells with corresponding as-fabricated standard cell layout renderings retrieved from the library of as fabricated standard cell layout renderings.

    SYSTEM AND METHOD FOR VERIFICATION AND VALIDATION OF INTEGRATED CIRCUIT

    公开(公告)号:US20240169512A1

    公开(公告)日:2024-05-23

    申请号:US17988850

    申请日:2022-11-17

    IPC分类号: G06T7/00

    摘要: In an integrated circuit (IC) analysis, a reference IC layout is stored. Instructions are readable and executable by an electronic processor to perform an IC analysis method, including: receiving layer images of a physical IC; extracting polygons depicted in the layer images; detecting errors in the physical IC by applying homeomorphic error detection to compare the extracted polygons with polygons of the reference IC layout; and displaying the detected errors on the display. The detecting of errors may include detecting an error comprising a topological inequivalence between an extracted polygon or pair of polygons and a polygon or pair of polygons of the reference IC layout. The detecting of errors may include detecting an error comprising a topological coverage error.