发明公开
- 专利标题: Method For Growing Single-Crystal Silicon Ingots and Single-Crystal Silicon Ingots
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申请号: US18564904申请日: 2022-10-28
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公开(公告)号: US20240263351A1公开(公告)日: 2024-08-08
- 发明人: Zhenliang SONG , Shaojie SONG
- 申请人: XI’AN ESWIN MATERIAL TECHNOLOGY CO., LTD.
- 申请人地址: CN Xi'an
- 专利权人: XI’AN ESWIN MATERIAL TECHNOLOGY CO., LTD.
- 当前专利权人: XI’AN ESWIN MATERIAL TECHNOLOGY CO., LTD.
- 当前专利权人地址: CN Xi'an
- 优先权: CN 2111411291.X 2021.11.25
- 国际申请: PCT/CN2022/128327 2022.10.28
- 进入国家日期: 2023-11-28
- 主分类号: C30B30/04
- IPC分类号: C30B30/04 ; C30B15/20 ; C30B29/06
摘要:
A method for growing a single-crystal silicon ingot and a single-crystal silicon ingot includes, during an initial stage of body growing process of the single-crystal silicon ingot, controlling an initial height of a horizontal magnetic field to be higher than a free surface of silicon melt. The method further includes, during the body growing process of the single-crystal silicon ingot, adjusting the horizontal magnetic field on convection intensity of the silicon melt to make oxygen concentration of the single-crystal silicon ingot to be decreased in an axial direction from a head portion to a tail portion.
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