发明公开
- 专利标题： SUBSTRATE HOLDER AND METHOD
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申请号： US18565964申请日： 2022-06-15
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公开(公告)号： US20240264540A1公开(公告)日： 2024-08-08
- 发明人: Marcus Adrianus Van de Kerkhof , Adrianus Hendrik Koevoets
- 申请人： ASML Netherlands B.V.
- 申请人地址： NL Veldhoven
- 专利权人： ASML Netherlands B.V.
- 当前专利权人： ASML Netherlands B.V.
- 当前专利权人地址： NL Veldhoven
- 优先权： EP 179874.9 2021.06.16
- 国际申请： PCT/EP2022/066326 2022.06.15
- 进入国家日期： 2023-11-30
- 主分类号： G03F7/00
- IPC分类号： G03F7/00 ; H01L21/67 ; H01L21/683
摘要：
A substrate holder for holding a substrate comprising a frame and a surface clamping device arranged on an underside of the frame configured to electrostatically attract an upper surface of the substrate from above the substrate. The substrate holder can be used to contactlessly hold and deform the substrate and thereby control a shape of the substrate. The substrate holder is suitable for use in a semiconductor processing apparatus and can operate in a vacuum or near-vacuum environment, such as in an EUV lithographic apparatus.
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