- 专利标题: SEMICONDUCTOR DEVICE AND METHOD FOR FABRICATING THE SAME
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申请号: US18606052申请日: 2024-03-15
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公开(公告)号: US20240274696A1公开(公告)日: 2024-08-15
- 发明人: Shunpei YAMAZAKI , Hideomi SUZAWA , Shinya SASAGAWA , Motomu KURATA , Masashi TSUBUKU
- 申请人: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- 申请人地址: JP Atsugi-shi
- 专利权人: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- 当前专利权人: SEMICONDUCTOR ENERGY LABORATORY CO., LTD.
- 当前专利权人地址: JP Atsugi-shi
- 优先权: JP 12203385 2012.09.14
- 分案原申请号: US15461575 2017.03.17
- 主分类号: H01L29/66
- IPC分类号: H01L29/66 ; H01L21/02 ; H01L27/12 ; H01L27/146 ; H01L29/786
摘要:
The on-state characteristics of a transistor are improved and thus, a semiconductor device capable of high-speed response and high-speed operation is provided. A highly reliable semiconductor device showing stable electric characteristics is made. The semiconductor device includes a transistor including a first oxide layer; an oxide semiconductor layer over the first oxide layer; a source electrode layer and a drain electrode layer in contact with the oxide semiconductor layer; a second oxide layer over the oxide semiconductor layer; a gate insulating layer over the second oxide layer; and a gate electrode layer over the gate insulating layer. An end portion of the second oxide layer and an end portion of the gate insulating layer overlap with the source electrode layer and the drain electrode layer.
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