- 专利标题: COMPOSITION AND METHOD FOR TREATING OBJECT TO BE TREATED
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申请号: US18609739申请日: 2024-03-19
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公开(公告)号: US20240279574A1公开(公告)日: 2024-08-22
- 发明人: Moe NARITA , Atsushi MIZUTANI
- 申请人: FUJIFILM Corporation
- 申请人地址: JP Tokyo
- 专利权人: FUJIFILM Corporation
- 当前专利权人: FUJIFILM Corporation
- 当前专利权人地址: JP Tokyo
- 优先权: JP 21160592 2021.09.30
- 主分类号: C11D7/08
- IPC分类号: C11D7/08 ; C11D7/32 ; C11D7/50
摘要:
An object of the present invention is to provide a composition having excellent ruthenium removability with respect to tungsten in a case of being applied to an object to be treated containing tungsten and ruthenium. The composition according to an embodiment of the present invention includes: periodic acid or a salt thereof, a quaternary ammonium salt; a resin containing a nitrogen atom; and a solvent.
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