公开(公告)号：US12091645B2

公开(公告)日：2024-09-17

申请号：US17040874

申请日：2019-03-25

申请人： TOKUYAMA CORPORATION

发明人： Hiroyuki Tasaki ,  Kazuhiro Kawaguchi

IPC分类号： C11D7/08 ,  C01B33/037

CPC分类号： C11D7/08 ,  C01B33/037 ,  C11D2111/22

摘要： In an embodiment of the present invention, contaminants contained in polycrystalline silicon are removed to obtain highly-pure polycrystalline silicon, with only a small amount of etching. Polycrystalline silicon is washed with use of: a first washing step of bringing fluonitric acid into contact with the polycrystalline silicon; and a second washing step of bringing a non-oxidizing chemical containing hydrofluoric acid into contact with the polycrystalline silicon that has undergone the first washing step.

公开(公告)号：US20240294854A1

公开(公告)日：2024-09-05

申请号：US18659733

申请日：2024-05-09

申请人： MITSUBISHI CHEMICAL CORPORATION

发明人： Kenichi KIYONO ,  Tomohiro KUSANO ,  Kan TAKESHITA ,  Mari ABE ,  Kanako MINAYOSHI

IPC分类号： C11D7/26 ,  C11D7/08 ,  H01L21/02 ,  H01L21/3105

CPC分类号： C11D7/261 ,  C11D7/08 ,  H01L21/02065 ,  H01L21/31053

摘要： A cleaning liquid for removing a cerium compound contains (A) a six-membered ring compound having two or more hydroxy groups, and (B) an inorganic acid compound, and a mass ratio of the component (B) to the component (A) is 0.05 to 0.6. The component (A) may contain at least one selected from the group consisting of catechol, resorcinol, hydroquinone, pyrogallol, and methylcatechol.

公开(公告)号：US11978622B2

公开(公告)日：2024-05-07

申请号：US15324588

申请日：2015-06-24

申请人： Entegris, Inc.

发明人： Lingyan Song ,  Steven Lippy ,  Emanuel I. Cooper

IPC分类号： H01L21/02 ,  B08B3/08 ,  C11D1/00 ,  C11D1/66 ,  C11D3/04 ,  C11D3/24 ,  C11D3/30 ,  C11D3/36 ,  C11D3/37 ,  C11D3/43 ,  C11D7/08 ,  C11D7/10 ,  C11D7/28 ,  C11D11/00

CPC分类号： H01L21/02068 ,  B08B3/08 ,  C11D1/008 ,  C11D1/667 ,  C11D3/042 ,  C11D3/046 ,  C11D3/245 ,  C11D3/30 ,  C11D3/361 ,  C11D3/3707 ,  C11D3/43 ,  C11D7/08 ,  C11D7/10 ,  C11D7/28 ,  C11D11/0047 ,  H01L21/02063

摘要： Cleaning compositions and processes for cleaning post-plasma etch residue from a microelectronic device having said residue thereon. The composition achieves highly efficacious cleaning of the residue material, including titanium-containing, copper-containing, tungsten-containing, and/or cobalt-containing post-etch residue from the microelectronic device while simultaneously not damaging the interlevel dielectric, metal interconnect material, and/or capping layers also present thereon.

公开(公告)号：US20240057653A1

公开(公告)日：2024-02-22

申请号：US18497573

申请日：2023-10-30

申请人： SMARTWASH SOLUTIONS, LLC

发明人： James M. BRENNAN ,  Danny Elmer LINDSTROM ,  Christopher Michael MCGINNIS ,  Eric Child WILHELMSEN

IPC分类号： A23N12/02 ,  A23B4/12 ,  A23B7/10 ,  A23L3/3454 ,  B08B3/04 ,  C11D11/00 ,  A22C17/08 ,  A23B4/24 ,  B08B1/00 ,  B08B3/08 ,  C11D7/08 ,  C11D7/26

CPC分类号： A23N12/02 ,  A23B4/12 ,  A23B7/10 ,  A23L3/3454 ,  B08B3/042 ,  C11D11/0064 ,  A22C17/08 ,  A23B4/24 ,  B08B1/002 ,  B08B3/08 ,  C11D7/08 ,  C11D7/261 ,  C11D7/265 ,  A23V2002/00 ,  Y02A40/90

摘要： A method of washing a food product with a short-term, intense treatment solution. One example method generally includes: applying, using a short-term wash device, a short-term wash treatment solution to the food product; and applying, using a wash device coupled to the short-term wash device, a wash treatment to the food product such that the wash treatment rinses the short-term wash treatment solution from the food product, wherein: the short-term wash treatment solution is applied to the food product for a shorter duration than the wash treatment is applied to the food product; the short-term wash treatment solution is chemically different from the wash treatment; and the short-term wash treatment solution comprises an acidulant and a polyol.

公开(公告)号：US11839229B2

公开(公告)日：2023-12-12

申请号：US18056124

申请日：2022-11-16

申请人： SMARTWASH SOLUTIONS, LLC

发明人： James M. Brennan ,  Danny Elmer Lindstrom ,  Christopher Michael McGinnis ,  Eric Child Wilhelmsen

IPC分类号： B08B3/04 ,  A23N12/02 ,  A23B4/12 ,  A23B7/10 ,  A23L3/3454 ,  C11D11/00 ,  A22C17/08 ,  A23B4/24 ,  B08B1/00 ,  B08B3/08 ,  C11D7/08 ,  C11D7/26

CPC分类号： A23N12/02 ,  A22C17/08 ,  A23B4/12 ,  A23B4/24 ,  A23B7/10 ,  A23L3/3454 ,  B08B1/002 ,  B08B3/042 ,  B08B3/08 ,  C11D7/08 ,  C11D7/261 ,  C11D7/265 ,  C11D11/0064 ,  A23V2002/00 ,  Y02A40/90

摘要： A method of washing a food product with a short-term, intense treatment solution. One example method generally includes: applying, using a short-term wash device, a short-term wash treatment solution to the food product; and applying, using a wash device coupled to the short-term wash device, a wash treatment to the food product such that the wash treatment rinses the short-term wash treatment solution from the food product, wherein: the short-term wash treatment solution is applied to the food product for a shorter duration than the wash treatment is applied to the food product; the short-term wash treatment solution is chemically different from the wash treatment; and the short-term wash treatment solution comprises an acidulant and a polyol.

公开(公告)号：US20220298456A1

公开(公告)日：2022-09-22

申请号：US17829682

申请日：2022-06-01

申请人： Mitsubishi Chemical Corporation

发明人： Longjie AN ,  Tomohiro KUSANO ,  Yukako ONO ,  Kan TAKESHITA ,  Kenichi KIYONO

IPC分类号： C11D7/36 ,  C11D7/08 ,  C11D7/26 ,  C11D7/32 ,  C11D11/00 ,  C09G1/02 ,  H01L21/306

摘要： The present invention relates to a cleaning liquid on a silicon oxide film and/or a silicon nitride film, and the cleaning liquid contains (i) at least one compound selected from the group consisting of a compound represented by the formula (1), a compound represented by formula (2), a compound represented by formula (3), and a compound represented by the formula (4); and (ii) a reducing agent; in the above formulas, R1 to R12 and n are the same as the definitions described in the description.

公开(公告)号：US20220259526A1

公开(公告)日：2022-08-18

申请号：US17177758

申请日：2021-02-17

申请人： Trojan Technologies Group ULC

发明人： Michael R. Sasges ,  Anthony Martin John Porter

IPC分类号： C11D17/04 ,  C11D7/26 ,  C11D7/08 ,  C11D11/00 ,  A61L2/26 ,  A61L2/10 ,  C02F1/32 ,  B08B9/023 ,  B08B1/00 ,  B08B3/08

摘要： An embodiment provides a method for cleaning a surface, including: encapsulating a cleaning composition in a polymer material to form a compound, wherein the polymer material surrounds the cleaning composition; placing the compound in a location adjacent to the surface, wherein the location adjacent to the surface is a volume separated from an outer volume; dissolving the polymer material at a pH above a target value above the polymer material pH dissolution point, wherein the dissolving releases the cleaning composition; and cleaning the surface using the released cleaning composition. Other aspects are described and claimed.

公开(公告)号：US11384314B2

公开(公告)日：2022-07-12

申请号：US17351335

申请日：2021-06-18

申请人： Harris Research, Inc.

发明人： Adnan Rashid Manassra ,  Christopher Wayne Smith

IPC分类号： C11D17/06 ,  C11D7/08 ,  C11D7/10 ,  C11D7/12 ,  C11D7/26 ,  C11D3/22 ,  C11D3/20 ,  C11D3/12 ,  C11D11/00 ,  C11D17/00 ,  C11D3/10

摘要： The disclosure provides cleaning compositions including at least one acid, at least one carbonate salt, at least one gum, at least one acid salt, and, optionally, at least one chelating agent. When exposed to an aqueous medium, the cleaning compositions may produce carbon dioxide. These cleaning compositions find use, for example, in cleaning textile fibers, such as carpets, drapery, upholstery, and the like. The disclosure provides methods of cleaning soiled textile fibers with a cleaning composition including gum arabic, at least one acid, and at least one carbonate salt.

公开(公告)号：US20220185711A9

公开(公告)日：2022-06-16

申请号：US17346739

申请日：2021-06-14

申请人： Green Products & Technologies, L.L.C.

发明人： John T. MacDonald, II ,  John Thomas MacDonald, III

IPC分类号： C02F1/68 ,  B01F5/04 ,  B01F5/06 ,  C09K8/68 ,  C09K8/72 ,  C11D7/08 ,  C11D7/32 ,  C07C229/08 ,  B01F17/00 ,  C02F1/66 ,  C09K8/035 ,  C09K8/62 ,  C09K13/06

摘要： Glycine is an organic compound that can be used in the making of a synthetic acid that obviates all the drawbacks of strong acids such as hydrochloric acid. The new compound is made by dissolving glycine in water, in a weight ratio of approximately 1:1 to 1:1.5. The solution is mixed until the glycine is essentially fully dissolved in the water. Once dissolution is complete, hydrogen chloride gas is dissolved in the solution to produce the new compound, which can be referred to as hydrogen glycine. Also disclosed is a method for adjusting the pH of a fluid, the method comprising adding an effective amount of a solution to the fluid for adjusting the pH thereof to a desired level, wherein the solution is prepared by mixing glycine in water to form a glycine solution; and adding hydrogen chloride to the glycine solution.

公开(公告)号：US11352593B2

公开(公告)日：2022-06-07

申请号：US17047571

申请日：2019-04-25

申请人： MITSUBISHI GAS CHEMICAL COMPANY, INC.

发明人： Akinobu Horita ,  Toshiyuki Oie ,  Takahiro Kikunaga ,  Kenji Yamada

IPC分类号： C11D7/08 ,  C11D7/28 ,  C11D7/36 ,  C11D11/00 ,  C23F1/16

摘要： An aqueous composition may include: (A) a fluoride ion supply source in an amount that gives a fluoride ion concentration of 0.05 to 30 mmol/L in the composition; (B) a cation supply source in an amount that gives a mole ratio of cations of 0.3 to 20 to the fluoride ions in the composition; and (C) 0.0001 to 10 mass % of one or more compounds selected from a C4-13 alkylphosphonic acid, a C4-13 alkylphosphonate ester, a C4-13 alkyl phosphate and a salt thereof, with respect to the total amount of the composition, wherein pH is in a range of from 2 to 6.