公开(公告)号：US20230223272A1

公开(公告)日：2023-07-13

申请号：US18174208

申请日：2023-02-24

Applicant: FUJIFILM Corporation

Inventor： Moe NARITA ,  Nobuaki SUGIMURA

IPC: H01L21/3213

CPC classification number: H01L21/32134

Abstract: The present invention provides a composition having an excellent dissolving ability for a transition metal-containing substance and a method for treating a substrate. The composition according to an embodiment of the present invention contains at least one oxohalogen acid compound selected from the group consisting of hypochlorous acid, chlorous acid, chloric acid, bromic acid, and salts thereof and a compound represented by Formula (1), in which a content of the compound represented by Formula (1) is 1.0% to 25.0% by mass with respect to a total mass of the composition.

公开(公告)号：US20250019836A1

公开(公告)日：2025-01-16

申请号：US18889891

申请日：2024-09-19

Applicant: FUJIFILM Corporation

Inventor： Kohei HAYASHI ,  Moe NARITA ,  Atsushi MIZUTANI

IPC: C23F11/12 ,  C23F11/04

Abstract: An object of the present invention is to provide a treatment liquid that has excellent removability of a metal part and suppressed dissolution of an insulating film in a case of being applied to an object to be treated, including the insulating film and the metal part. The treatment liquid of an embodiment of the present invention includes water, a fluoride source, periodic acid or a salt thereof, and a surfactant, and satisfies at least one of the following requirement A, the following requirement B, or the following requirement C.
Requirement A: The surfactant includes a cationic surfactant and has a predetermined aliphatic hydrocarbon group, and the cationic surfactant has a molecular weight of 300 or less.
Requirement B: The surfactant includes an anionic surfactant, the anionic surfactant has a predetermined group, and a mass ratio of a content of the anionic surfactant to a content of the fluoride source is 0.01 to 0.5.
Requirement C: The surfactant includes a nonionic surfactant, and the nonionic surfactant does not have a fluorine atom and is represented by a predetermined formula.

公开(公告)号：US20240279574A1

公开(公告)日：2024-08-22

申请号：US18609739

申请日：2024-03-19

Applicant: FUJIFILM Corporation

Inventor： Moe NARITA ,  Atsushi MIZUTANI

IPC: C11D7/08 ,  C11D7/32 ,  C11D7/50

CPC classification number: C11D7/08 ,  C11D7/3209 ,  C11D7/50 ,  C11D2111/22

Abstract: An object of the present invention is to provide a composition having excellent ruthenium removability with respect to tungsten in a case of being applied to an object to be treated containing tungsten and ruthenium. The composition according to an embodiment of the present invention includes: periodic acid or a salt thereof, a quaternary ammonium salt; a resin containing a nitrogen atom; and a solvent.

公开(公告)号：US20240002725A1

公开(公告)日：2024-01-04

申请号：US18468123

申请日：2023-09-15

Applicant: FUJIFILM Corporation

Inventor： Moe NARITA ,  Atsushi MIZUTANI

IPC: C09K13/06 ,  H01L21/02 ,  B08B3/08 ,  C23F1/30

CPC classification number: C09K13/06 ,  H01L21/02068 ,  B08B3/08 ,  C23F1/30 ,  H01L23/53242

Abstract: An object of the present invention is to provide a composition that leaves few residues in a case where the composition is brought into contact with a Ru-containing substance to perform an etching treatment on the Ru-containing substance, and to provide a method for treating a substrate. The composition according to an embodiment of the present invention contains one or more periodic acid compounds selected from the group consisting of a periodic acid and a salt thereof, a quaternary ammonium salt represented by Formula (A), and a trialkylamine or a salt thereof.

公开(公告)号：US20220282156A1

公开(公告)日：2022-09-08

申请号：US17825722

申请日：2022-05-26

Applicant: FUJIFILM Corporation

Inventor： Moe NARITA ,  Atsushi Mizutani

IPC: C09K13/06 ,  H01L21/02 ,  H01L21/3213

Abstract: A composition contains a periodic acid compound selected from the group consisting of a periodic acid and a salt thereof, an amine compound that is a specific compound represented by Formula (1) or a salt thereof, and water.