- 专利标题： PHOTOSENSITIVE COMPOSITION COMPRISING INORGANIC PARTICLE
-
申请号： US18566809申请日： 2022-03-16
-
公开(公告)号： US20240280904A1公开(公告)日： 2024-08-22
- 发明人: Changmin LEE , Yun Jong KO , Jun BAE , Jun Ki KIM , Jin Hyun KIM , Younghoon KANG , Soung Yun MUN
- 申请人： DUK SAN NEOLUX CO., LTD.
- 申请人地址： KR Cheonan-si, Chungcheongnam-do
- 专利权人： DUK SAN NEOLUX CO., LTD.
- 当前专利权人： DUK SAN NEOLUX CO., LTD.
- 当前专利权人地址： KR Cheonan-si, Chungcheongnam-do
- 优先权： KR 20210074332 2021.06.08
- 国际申请： PCT/KR2022/003646 2022.03.16
- 进入国家日期： 2023-12-04
- 主分类号： G03F7/075
- IPC分类号： G03F7/075 ; H10K59/38 ; H10K59/40
摘要：
Provided are a photosensitive composition prepared with silica particles having a reactive functional group introduced to their surface, thereby having high photosensitivity and implementing a highly reliable curing pattern even in a low-temperature post-baking treatment process, and an organic light emitting display device in which the photosensitive composition is applied.
信息查询
IPC分类:
