发明公开
- 专利标题: THERMAL PADS BETWEEN STACKED SEMICONDUCTOR DIES AND ASSOCIATED SYSTEMS AND METHODS
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申请号: US18751061申请日: 2024-06-21
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公开(公告)号: US20240347511A1公开(公告)日: 2024-10-17
- 发明人: Jaspreet S. Gandhi , Michel Koopmans
- 申请人: Micron Technology, Inc.
- 申请人地址: US ID Boise
- 专利权人: Micron Technology, Inc.
- 当前专利权人: Micron Technology, Inc.
- 当前专利权人地址: US ID Boise
- 分案原申请号: US14171169 2014.02.03
- 主分类号: H01L25/065
- IPC分类号: H01L25/065 ; H01L21/768 ; H01L23/00 ; H01L23/367 ; H01L23/48 ; H01L25/00
摘要:
Systems and methods are described for improved heat dissipation of the stacked semiconductor dies by including metallic thermal pads between the dies in the stack. In one embodiment, the thermal pads may be in direct contact with the semiconductor dies. Heat dissipation of the semiconductor die stack can be improved by a relatively high thermal conductivity of the thermal pads that directly contact the adjacent silicon dies in the stack without the intervening layers of the low thermal conductivity materials (e.g., passivation materials). In some embodiments, the manufacturing yield of the stack can be improved by having generally coplanar top surfaces of the thermal pads and under-bump metallization (UBM) structures.
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