Invention Application
- Patent Title: REALIZATION OF A PERFECT LIGHT ABSORBER IN TWO-DIMENSIONAL BILAYER BY REDUCING INTERLAYER INTERACTION
-
Application No.: US18733569Application Date: 2024-06-04
-
Publication No.: US20240402400A1Publication Date: 2024-12-05
- Inventor: Seungjun Lee , Dongjea Seo , Sang Hyun Park , Tony Low , Steven J. Koester , Rehan Younas , Christopher Hinkle
- Applicant: Regents of the University of Minnesota , University of Notre Dame du Lac
- Applicant Address: US MN Minneapolis; US IN South Bend
- Assignee: Regents of the University of Minnesota,University of Notre Dame du Lac
- Current Assignee: Regents of the University of Minnesota,University of Notre Dame du Lac
- Current Assignee Address: US MN Minneapolis; US IN South Bend
- Main IPC: G02B5/00
- IPC: G02B5/00

Abstract:
Approaches to stack monolayer transition metal dichalcogenides (TMD) materials to develop near-perfect light absorbers (NPLAs) with only two atomic layers of TMD. Stacking TMDs may result in interlayer coupling with undesirable light absorbing behavior. The NPLAs of this disclosure stacks monolayer TMDs in such a way as to minimize TMD interlayer coupling, thus preserving TMD strong band nesting properties. Examples of approaches in this disclosure control the interlayer coupling by, for example, (a) twisted TMD bi-layers and (b) adding a buffer layer, e.g., a TMD/buffer layer/TMD tri-layer heterostructure. The NPLAs of this disclosure use the band nesting effect in TMDs, combined with a Salisbury screen geometry, to demonstrate NPLAs using only two or three uniform atomic layers of TMDs.
Information query