Invention Application
- Patent Title: METHOD OF MANUFACTURING EDGE EMITTING LASERS BY CLEAVING A SEMICONDUCTOR WAFER ALONG ONE OR MORE STREETS FORMED ON THE WAFER
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Application No.: US18205340Application Date: 2023-06-02
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Publication No.: US20240405505A1Publication Date: 2024-12-05
- Inventor: Dapeng XU , Klaus Alexander ANSELM , Nahid Sultana
- Applicant: Applied Optoelectronics, Inc.
- Applicant Address: US TX Sugar Land
- Assignee: Applied Optoelectronics, Inc.
- Current Assignee: Applied Optoelectronics, Inc.
- Current Assignee Address: US TX Sugar Land
- Main IPC: H01S5/02
- IPC: H01S5/02 ; H01S5/028 ; H01S5/10 ; H01S5/22 ; H01S5/40

Abstract:
Methods of manufacturing edge-emitting lasers include cleaving a semiconductor wafer along one or more streets formed on the wafer. A street is an extended region formed without dielectric and metal layers and may be formed on the semiconductor wafer, for example, by a selective wet etching process or a dry etching process. Cleaving along the street(s) without dielectric and metal layers achieves cleaved facets, which are substantially free from microstep defects and metal contamination. After cleaving, a dielectric material may be provided on the remaining street portions along the ends of the cleaved facets, for example, by intentional overspray deposition of facet coatings.
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