Invention Application
- Patent Title: PREVENTION OF CONTAMINATION OF SUBSTRATES DURING GAS PURGING
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Application No.: US18814094Application Date: 2024-08-23
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Publication No.: US20250038024A1Publication Date: 2025-01-30
- Inventor: Douglas Brian Baumgarten , Russell Kaplan , Amitabh Puri , Paul B. Reuter
- Applicant: Applied Materials, Inc.
- Applicant Address: US CA Santa Clara
- Assignee: Applied Materials, Inc.
- Current Assignee: Applied Materials, Inc.
- Current Assignee Address: US CA Santa Clara
- Main IPC: H01L21/673
- IPC: H01L21/673 ; C23C16/44 ; C23C16/455 ; C23C16/458 ; C23C16/52 ; C23C16/54 ; H01L21/67 ; H01L21/677
Abstract:
Disclosed are implementations for efficient purging of substrate carriers (and content held therein) and preventing external contaminants from entering a gas purge apparatus by coupling the gas purge apparatus to a substrate carrier, performing a first gas purging session of an environment of the substrate carrier, receiving a first signal of a first signal type, responsive to receiving the first signal, keeping the gas purge apparatus coupled to the substrate carrier, performing a second gas purging session of the environment of the substrate carrier, receiving a second signal of a second signal type, and, responsive to receiving the second signal, decoupling the purge apparatus from the substrate carrier.
Information query
IPC分类:
