发明授权
- 专利标题： Method for preparing positive resist image
- 专利标题（中）： 正抗蚀剂图像的制备方法
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申请号： US591980申请日： 1975-06-30
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公开(公告)号： US3984582A公开(公告)日： 1976-10-05
- 发明人: Ralph Feder , Ivan Haller , Michael Hatzakis , Lubomyr T. Romankiw , Eberhard A. Spiller
- 申请人： Ralph Feder , Ivan Haller , Michael Hatzakis , Lubomyr T. Romankiw , Eberhard A. Spiller
- 申请人地址： NY Armonk
- 专利权人： IBM
- 当前专利权人： IBM
- 当前专利权人地址： NY Armonk
- 主分类号： G03F7/20
- IPC分类号： G03F7/20 ; G03F7/039 ; G03F7/32 ; G03F7/38 ; H01L21/027 ; B05D3/06
摘要：
A positive resist image is produced by exposing, to radiation in a predetermined pattern, a polymeric material containing polymerized alkyl methacrylate units and polymerized monoethylenically unsaturated acid units. The exposed and unexposed areas are distinguished by their different respective abilities to be swelled in an appropriate swelling agent, and the swelled areas are removed by dispersal in a nonsolvent liquid.