发明授权
US4086090A Formation of pattern using acrylamide-diacetoneacrylamide copolymer
失效
使用丙烯酰胺 - 双丙酮丙烯酰胺共聚物形成图案
- 专利标题: Formation of pattern using acrylamide-diacetoneacrylamide copolymer
- 专利标题(中): 使用丙烯酰胺 - 双丙酮丙烯酰胺共聚物形成图案
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申请号: US615529申请日: 1975-09-22
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公开(公告)号: US4086090A公开(公告)日: 1978-04-25
- 发明人: Takahiro Kohashi , Motoo Akagi , Yoichi Oba , Saburo Nonogaki , Makoto Tanaka , Tadao Kaneko , Yoshifumi Tomita
- 申请人: Takahiro Kohashi , Motoo Akagi , Yoichi Oba , Saburo Nonogaki , Makoto Tanaka , Tadao Kaneko , Yoshifumi Tomita
- 申请人地址: JA Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JA Tokyo
- 优先权: JA48-83172 19730725
- 主分类号: G03F7/012
- IPC分类号: G03F7/012 ; G03F7/085 ; G03F7/20 ; H01J9/227 ; G03C5/00
摘要:
The present invention affords a process for forming a pattern having a surface area substantially equal to or smaller than area of apertures of shadow-mask through which beams pass on a photoresist film, which contains an acrylamidediacetoneacrylamide copolymer and a water-soluble aromatic bisazide compound, by exposing said photoresist film to light through a mask having the pattern and then developing the film.The use of said photoresist film for the preparation of a phosphor screen of a color picture tube of a black matrix or black stripe type does not require a special technique such as post-etching of a shadow mask and makes it possible to form a three primary color phosphor pattern having a surface area substantially equal to or smaller than the area of apertures of the shadow mask through which lightbeams pass, without mutual "bridging" between phosphor dots. Thus, an excellent phosphor screen of a color picture tube of a black matrix or black stripe type can be prepared.
公开/授权文献
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