公开(公告)号：US20210198416A1

公开(公告)日：2021-07-01

申请号：US15779197

申请日：2016-12-16

申请人： TORAY INDUSTRIES, INC.

发明人： Mika Koshino ,  Miki Nakamichi ,  Mitsuhito Suwa

IPC分类号： C08G59/36 ,  C08K5/521 ,  G03F7/085 ,  G03F7/027

摘要： A photosensitive resin composition contains (A) an ethylenically unsaturated group- and carboxyl group-containing photoreactive resin, (B) an epoxy compound, (C) a polyfunctional epoxy compound, and (D) a photopolymerization initiator.

公开(公告)号：US20210149305A1

公开(公告)日：2021-05-20

申请号：US17084195

申请日：2020-10-29

申请人： ROHM AND HAAS ELECTRONIC MATERIALS KOREA LTD.

发明人： Su Min Lee ,  Jin Kwon ,  Ho-Suk Song

IPC分类号： G03F7/085 ,  G03F7/033 ,  G03F7/004

摘要： The present invention relates to a photosensitive resin composition and an insulation film prepared therefrom. Since the photosensitive resin composition comprises a blocked isocyanate-based compound, it can form a transparent insulation film while it maintains excellent film retention rate, hardness, and resolution.

公开(公告)号：US10365560B2

公开(公告)日：2019-07-30

申请号：US15085530

申请日：2016-03-30

申请人： SUMITOMO CHEMICAL COMPANY, LIMITED

发明人： Masako Sugihara ,  Junji Nakanishi ,  Takashi Nishimura

IPC分类号： G03F7/039 ,  G03F7/004 ,  G03F7/085 ,  G03F7/32 ,  G03F7/38 ,  G03F7/40

摘要： A resist composition contains: a resin having a structural unit represented by formula (I), an alkali-soluble resin, an acid generator, and a solvent: wherein Ri51 represents a hydrogen atom or a methyl group, Ri52 and Ri53 each independently represent a hydrogen atom or a C1 to C12 hydrocarbon group, Ri54 represents a C5 to C20 alicyclic hydrocarbon group, Ri55 represents a C1 to C6 alkyl group or a C1 to C6 alkoxy group, and “p” represents an integer of 0 to 4.

公开(公告)号：US10254646B2

公开(公告)日：2019-04-09

申请号：US14654313

申请日：2012-12-19

申请人： IBF INDUSTRIA BRASILEIRA DE FILMES S/A

发明人： Andre Luiz Arias ,  Luiz Nei Arias ,  Marjorie Arias ,  Mario Italo Provenzano

IPC分类号： G03F7/033 ,  G03F7/029 ,  G03F7/031 ,  G03C1/73 ,  B41N1/04 ,  G03F7/20 ,  G03F7/32 ,  G03F7/38 ,  G03F7/027 ,  G03F7/085 ,  G03F7/09 ,  G03F7/105

摘要： Provided is a composition that is sensitive to radiation in electromagnetic spectrum ranges for printing purposes, and includes (a) one or more binder polymers; (b) an ethylenically unsaturated compound; (c) one or more compounds that absorbs radiations in the selected region of the spectrum; (d) a sensitizer; (e) optionally a photoaccelarator; (f) an adhesion promoter; (g) a dye; and (h) optionally thermal polymerization inhibitors. Also provided is a printing plate including the radiation sensitive composition, as well as the use of the composition and an image developing process.

公开(公告)号：US10138390B2

公开(公告)日：2018-11-27

申请号：US14389105

申请日：2013-12-11

申请人： BOE TECHNOLOGY GROUP CO., LTD.

发明人： Ming Zhao

IPC分类号： C09D133/10 ,  C09C1/28 ,  C09C1/30 ,  C09D133/12 ,  C09D133/24 ,  G02B5/20 ,  C09B67/00 ,  C09B67/46 ,  G03F7/00 ,  G03F7/004 ,  G03F7/029 ,  G03F7/031 ,  G03F7/032 ,  G03F7/033 ,  G03F7/075 ,  G03F7/085 ,  G03F7/105

摘要： The invention relates to the field of materials technology and provides a modified nano-silica and a method for preparing the same, a pigment dispersion and a photosensitive resin composition, so as to solve the problem that conventional nano-silica cannot crosslink with other polymeric materials, and pigment dispersions are apt to aggregate and have a poor film-forming property. The modified nano-silica according to the invention has unsaturated double bonds on the surface thereof and can crosslink with other polymeric materials, such that the pigment dispersion comprising the modified nano-silica can effectively prevent agglomeration and has a good film-forming property, and the photosensitive resin composition comprising the pigment dispersion can reduce the thermal expansion of a film made thereby, as well as the occurrence of shrinkage and collapse phenomena in the surface of the film, and enhance the heat-resistance, chemical-resistance, mechanical properties and abrasion-resistance of the film.

公开(公告)号：US09810983B2

公开(公告)日：2017-11-07

申请号：US15185195

申请日：2016-06-17

申请人： SHIN-ETSU CHEMICAL CO., LTD.

发明人： Jun Hatakeyama ,  Koji Hasegawa ,  Masayoshi Sagehashi

IPC分类号： G03F7/039 ,  C08F220/16 ,  C08F224/00 ,  G03F7/32 ,  C08F222/20 ,  G03F7/004 ,  G03F7/085

CPC分类号： G03F7/0392 ,  C08F220/16 ,  C08F220/20 ,  C08F220/30 ,  C08F222/20 ,  C08F224/00 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/0395 ,  G03F7/0397 ,  G03F7/085 ,  C08F2220/302 ,  C08F228/02

摘要： A positive resist composition comprising a polymer comprising recurring units having both an acyl or alkoxycarbonyl group and an acid labile group-substituted hydroxyl group exhibits a high contrast of alkaline dissolution rate before and after exposure, a high resolution, a good pattern profile and minimal edge roughness.

公开(公告)号：US09110371B2

公开(公告)日：2015-08-18

申请号：US14403233

申请日：2013-05-28

申请人： Hitachi Chemical Company, Ltd.

发明人： Katsutoshi Itagaki ,  Masanori Shindou

IPC分类号： G03F7/032 ,  H05K3/06 ,  H05K3/10 ,  G03F7/085 ,  G03F7/20 ,  H05K3/24 ,  H05K3/18

CPC分类号： G03F7/085 ,  G03F7/027 ,  G03F7/20 ,  G03F7/40 ,  H05K3/064 ,  H05K3/108 ,  H05K3/184 ,  H05K3/241

摘要： Provided is a photosensitive resin composition, including: a binder polymer; a photopolymerizable compound having an ethylenically unsaturated group; a photopolymerization initiator; a benzotriazole compound; and an aliphatic diamine compound having from 8 to 30 carbon atoms.

摘要翻译： 提供一种感光性树脂组合物，其包含：粘合剂聚合物; 具有烯属不饱和基团的光聚合化合物; 光聚合引发剂; 苯并三唑化合物; 和碳原子数为8〜30的脂肪族二胺化合物。

公开(公告)号：US09109060B2

公开(公告)日：2015-08-18

申请号：US13382397

申请日：2010-07-07

申请人： Atsushi Yasuda ,  Tomoya Oshikiri ,  Daisuke Matsumoto ,  Keisuke Katou ,  Shinichi Maeda

发明人： Atsushi Yasuda ,  Tomoya Oshikiri ,  Daisuke Matsumoto ,  Keisuke Katou ,  Shinichi Maeda

IPC分类号： G03F7/039 ,  C08F224/00 ,  C08F24/00 ,  C08F297/02 ,  C08F2/00 ,  G03F7/004 ,  G03F7/085

CPC分类号： C08F24/00 ,  C08F2/00 ,  C08F297/026 ,  C08F2500/06 ,  G03F7/0045 ,  G03F7/0046 ,  G03F7/039 ,  G03F7/0397 ,  G03F7/085

摘要： A method for producing a polymer is provided. The polymer improves variations in the content ratio and molecular weights of a copolymer's constitutional units, solvent solubility, and the sensitivity of a resist composition using such a polymer. The method includes polymerizing two or more monomers while adding with a polymerization initiator to obtain the polymer, feeding a first solution containing first composition monomers in an initial polymerization stage, and starting dropwise addition of a second solution containing second composition monomers after or simultaneously with the feeding of the first solution. The second composition is equal to a target composition ratio of the polymer to be obtained. The first composition is calculated in advance based on a target composition ratio and the reactivity of the monomers. The above dropping rate is set to high.

摘要翻译： 提供聚合物的制造方法。 聚合物改善共聚物的结构单元的含量比和分子量的变化，溶剂的溶解度以及使用这种聚合物的抗蚀剂组合物的灵敏度。 该方法包括聚合两种或更多种单体，同时加入聚合引发剂以获得聚合物，在初始聚合阶段中加入含有第一组合物单体的第一溶液，并在第二组合物单体或与其同时开始滴加含有第二组合物单体的第二溶液 喂养第一种方案。 第二组合物等于所得聚合物的目标组成比。 基于目标组成比和单体的反应性，预先计算第一组合物。 上述滴加速度设定为高。

公开(公告)号：US07252912B2

公开(公告)日：2007-08-07

申请号：US11094076

申请日：2005-03-29

申请人： Kazunori Kataoka ,  Akihiro Hirano ,  Takeshi Ikeya ,  Toru Shibuya

发明人： Kazunori Kataoka ,  Akihiro Hirano ,  Takeshi Ikeya ,  Toru Shibuya

IPC分类号： G03F7/012 ,  G03F7/008 ,  G03F7/038 ,  G03F7/11 ,  G03F7/085

CPC分类号： C09D129/04 ,  C08J7/18 ,  C08K5/28 ,  C08K5/42 ,  C08L2312/06 ,  C12M23/20 ,  C12Q1/00 ,  G03F7/012 ,  Y10S430/155 ,  Y10T428/31536 ,  Y10T428/31855

摘要： A polymer composite comprises a base material, and a polymer membrane provided on at least a part of the base material, the polymer membrane having at least hydrophilicity, and the polymer composite is used in a state exposed to water or a water-based solvent. The polymer membrane is a resin film formed by photo-crosslinking a photosensitive resin composition consisting essentially of a water-soluble polymer, and during crosslinking of the photosensitive resin composition, some of photosensitive groups of the photosensitive resin composition are bound to amino groups fixed to the surface of the base material, whereby the resin film is fixed to the base material.

摘要翻译： 聚合物复合材料包括基材和至少部分基材上的聚合物膜，所述聚合物膜具有至少亲水性，聚合物复合物以暴露于水或水基溶剂的状态使用。 聚合物膜是通过使基本上由水溶性聚合物组成的感光性树脂组合物进行光交联而形成的树脂膜，在感光性树脂组合物的交联中，感光性树脂组合物的一些感光性基团与固定于 基材的表面，由此将树脂膜固定在基材上。

公开(公告)号：US06967072B2

公开(公告)日：2005-11-22

申请号：US09921938

申请日：2001-08-02

申请人： Ian Latchford ,  Christopher Dennis Bencher ,  Yuxiang Wang ,  Mario Dave Silvetti

发明人： Ian Latchford ,  Christopher Dennis Bencher ,  Yuxiang Wang ,  Mario Dave Silvetti

IPC分类号： B01J19/08 ,  C23C16/26 ,  C23C16/46 ,  G03C5/00 ,  G03F7/075 ,  G03F7/09 ,  H01L21/027 ,  H01L21/283 ,  H01L21/311 ,  H01L21/312 ,  H01L21/314 ,  H01L21/316 ,  H01L21/3205 ,  H01L21/768 ,  G03F7/004 ,  G03F7/085

CPC分类号： H01L21/31144 ,  G03F7/0757 ,  G03F7/091 ,  H01L21/0276 ,  H01L21/76802 ,  H01L21/76825 ,  H01L21/76832

摘要： A method for forming a patterned amorphous carbon layer in a semiconductor stack, including forming an amorphous carbon layer on a substrate and forming a silicon containing photoresist layer on top of the amorphous carbon layer. Thereafter, the method includes developing a pattern transferred into the resist layer with a photolithographic process and etching through the amorphous carbon layer in at least one region defined by the pattern in the resist layer, wherein a resist layer hard mask is formed in an outer portion of the photoresist layer during etching.

摘要翻译： 一种在半导体堆叠中形成图案化的非晶碳层的方法，包括在基底上形成无定形碳层，并在无定形碳层的顶部形成含硅光致抗蚀剂层。 此后，该方法包括通过光刻工艺显影转印到抗蚀剂层中的图案，并且在由抗蚀剂层中的图案限定的至少一个区域中通过无定形碳层进行蚀刻，其中在外部形成抗蚀剂层硬掩模 的光刻胶层。