发明授权
- 专利标题: Lith-type silver halide photographic light-sensitive material
- 专利标题(中): Lith型卤化银照相感光材料
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申请号: US822601申请日: 1977-08-08
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公开(公告)号: US4121935A公开(公告)日: 1978-10-24
- 发明人: Yoshio Nishina , Teiji Habu , Tomio Nakajima , Akio Oshima , Eiichi Sakamoto , Noboru Fujimori , Kiyomitsu Mine , Hiroo Toya
- 申请人: Yoshio Nishina , Teiji Habu , Tomio Nakajima , Akio Oshima , Eiichi Sakamoto , Noboru Fujimori , Kiyomitsu Mine , Hiroo Toya
- 申请人地址: JPX Tokyo
- 专利权人: Konishiroku Photo Industry Co., Ltd.
- 当前专利权人: Konishiroku Photo Industry Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX49-107314 19740924
- 主分类号: G03C1/18
- IPC分类号: G03C1/18 ; G03C5/04 ; G03C1/06
摘要:
A lith-type silver halide photographic light-sensitive material for forming halftone dot images is disclosed which contains a sensitizing dye represented by the following general formula: ##STR1## WHEREIN Z.sub.1 is an atomic group necessary for forming a naphthothiazole ring, Z.sub.2 is an atomic group necessary for forming a member selected from a group consisting of substituted or unsubstituted, benzothiazole, benzoselenazole, naphthothiazole and naphthoselenazole nucleus, R.sub.1 and R.sub.2 are respectively a substituted or unsubstituted alkyl group, X.sup..theta. is an anion, and n is a positive integer of 1 or 2 with the proviso that when the dye is an inner salt, n is 1.
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