发明授权
- 专利标题: Process for preparing a lithographic printing plate with a thiourea wetting solution
- 专利标题(中): 用硫脲润湿溶液制备平版印刷版的方法
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申请号: US912150申请日: 1978-06-02
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公开(公告)号: US4177072A公开(公告)日: 1979-12-04
- 发明人: Yoshihiro Ono , Shigeo Harada , Yuzo Mizobuchi , Tomoaki Ikeda
- 申请人: Yoshihiro Ono , Shigeo Harada , Yuzo Mizobuchi , Tomoaki Ikeda
- 申请人地址: JPX Minami-ashigara
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JPX Minami-ashigara
- 优先权: JPX53/65151 19780602
- 主分类号: B41N3/08
- IPC分类号: B41N3/08 ; G03C1/705 ; G03F7/004 ; G03F7/02 ; G03C5/24
摘要:
A process for preparing a lithographic printing plate, which has excellent printability, durability and stability, which comprisingimagewise irradiating a lithographic printing plate material comprising a support having thereon a light-sensitive layer comprising, as essential components, (a) an inorganic material and (b) at least one member selected from the group consisting of a metal and a metal compound, both of which are in contact with each other and which, upon irradiation with electromagnetic radiation, react with each other forming a mutually diffused state and as a result, a difference in the hydrophilic property or in the oleophilic property occurs between the areas irradiated with the electromagnetic radiation and the non-irradiated areas, with electromagnetic radiation, andthen wetting the light-sensitive layer thereof with wetting solution containing (i) at least one compound selected from the group consisting of thiourea and a thiourea derivative and (ii) as an acid component, at least one compound selected from the group consisting of an inorganic acid, an acidic inorganic salt, and an organic acid.
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