Image forming materials and image forming process
    1.
    发明授权
    Image forming materials and image forming process 失效
    成像材料及成像工艺

    公开(公告)号:US4198237A

    公开(公告)日:1980-04-15

    申请号:US26713

    申请日:1979-04-03

    IPC分类号: G03C1/705 G03C1/48 G03F7/02

    CPC分类号: G03C1/705

    摘要: An image forming material comprising a support having thereon a layer composed of a Ge--S composition or a Ge--S--X composition wherein X represents at least one element selected from the group consisting of Al, Si, Mg, Ti, V, Mn, Co, Ni, Sn, Zn, Pd, In, Se, Te, Fe, I, P and O which undergoes a structural change capable of being detected optically, electrically or chemically upon exposure imagewise to light wherein the Ge--S or Ge--S--X composition layer has a thickness of at least about 300A and contains therein at least one element selected from the group consisting of Ag, Cu and Pb in an amount of more than 2 atoms of Ag, Cu and/or Pb based on 100 atoms of the Ge--S composition or the Ge--S--X composition.

    摘要翻译: 一种成像材料,其包含其上具有由Ge-S组合物或Ge-SX组合物构成的层的载体,其中X表示选自Al,Si,Mg,Ti,V,Mn,Co中的至少一种元素 ,Ni,Sn,Zn,Pd,In,Se,Te,Fe,I,P和O,其经历结构变化,其能够在曝光成像时以光学,电学或化学方式被检测,其中Ge-S或Ge-SX 组成层具有至少约300A的厚度,并且其中含有至少一种选自Ag,Cu和Pb中的至少一种元素,其量为基于100原子的Ag,Cu和/或Pb多于2个原子 Ge-S组成或Ge-SX组成。

    Image forming materials and image forming process
    2.
    发明授权
    Image forming materials and image forming process 失效
    成像材料及成像工艺

    公开(公告)号:US4286045A

    公开(公告)日:1981-08-25

    申请号:US94618

    申请日:1979-11-15

    CPC分类号: G03C1/705

    摘要: An image forming material comprising a support having thereon a layer composed of a Ge-S composition or a Ge-S-X composition wherein X represents at least one element selected from the group consisting of Al, Si, Mg, Ti, V, Mn, Co, Ni, Sn, Zn, Pd, In, Se, Te, Fe, I, P and O which undergoes a structural change capable of being detected optically, electrically or chemically upon exposure imagewise to light wherein the Ge-S or Ge-S-X composition layer has a thickness of at least about 300 A and contains therein at least one element selected from the group consisting of Ag, Cu and Pb in an amount of more than 2 atoms of Ag, Cu and/or Pb based on 100 atoms of the Ge-S composition or the Ge-S-X composition.

    摘要翻译: 一种成像材料,其包含其上具有由Ge-S组合物或Ge-SX组合物构成的层的载体,其中X表示选自Al,Si,Mg,Ti,V,Mn,Co中的至少一种元素 ,Ni,Sn,Zn,Pd,In,Se,Te,Fe,I,P和O,其经历结构变化,其能够在曝光成像时以光学,电学或化学方式被检测,其中Ge-S或Ge-SX 组成层具有至少约300的厚度,并且其中含有选自Ag,Cu和Pb中的至少一种元素,其量大于2原子的Ag,Cu和/或Pb,基于100原子的 Ge-S组合物或Ge-SX组合物。

    Process for preparing a lithographic printing plate with a thiourea
wetting solution
    3.
    发明授权
    Process for preparing a lithographic printing plate with a thiourea wetting solution 失效
    用硫脲润湿溶液制备平版印刷版的方法

    公开(公告)号:US4177072A

    公开(公告)日:1979-12-04

    申请号:US912150

    申请日:1978-06-02

    CPC分类号: B41N3/08 G03C1/705 G03F7/0044

    摘要: A process for preparing a lithographic printing plate, which has excellent printability, durability and stability, which comprisingimagewise irradiating a lithographic printing plate material comprising a support having thereon a light-sensitive layer comprising, as essential components, (a) an inorganic material and (b) at least one member selected from the group consisting of a metal and a metal compound, both of which are in contact with each other and which, upon irradiation with electromagnetic radiation, react with each other forming a mutually diffused state and as a result, a difference in the hydrophilic property or in the oleophilic property occurs between the areas irradiated with the electromagnetic radiation and the non-irradiated areas, with electromagnetic radiation, andthen wetting the light-sensitive layer thereof with wetting solution containing (i) at least one compound selected from the group consisting of thiourea and a thiourea derivative and (ii) as an acid component, at least one compound selected from the group consisting of an inorganic acid, an acidic inorganic salt, and an organic acid.

    摘要翻译: 一种制备平版印刷版的方法,其具有优异的可印刷性,耐久性和稳定性,其包括成像照射平版印刷版材料,所述平版印刷版材料包含其上具有光敏层的载体,所述载体包含作为必要组分的(a)无机材料和 (b)选自金属和金属化合物中的至少一种,两者彼此接触并且在电磁辐射照射时彼此反应形成相互扩散的状态,并且作为 结果,在用电磁辐射照射的电磁辐射区域和未照射区域之间发生亲水性或亲油性的差异,然后用润湿溶液润湿其感光层,所述润湿溶液含有(i) 选自硫脲和硫脲衍生物的至少一种化合物和(ii)作为酸性的 选自由无机酸,酸性无机盐和有机酸组成的组中的至少一种化合物。

    Non-treatment type planographic printing plate materials
    4.
    发明授权
    Non-treatment type planographic printing plate materials 失效
    非处理型平版印刷版材料

    公开(公告)号:US4197124A

    公开(公告)日:1980-04-08

    申请号:US875708

    申请日:1978-02-06

    IPC分类号: G03C1/705 G03C1/76 G03F7/02

    CPC分类号: G03C1/705 Y10S430/133

    摘要: A planographic printing plate material comprising a support and a light sensitive layer provided on the support, the light-sensitive layer being composed of (A) an inorganic material; (B) at least one metal and/or metal compound [(A)/(B) are capable of reacting with each other upon application of electromagnetic radiation] and (C) an organic compound capable of affecting the reaction between the inorganic material (A) and the metal and/or metal compound (B), wherein the inorganic material (A), the metal or metal compound (B), and the organic compound (C) are in contact with each other. When the light-sensitive layer is exposed to electromagnetic radiation, a difference in the hydrophilic or oleophilic nature of the exposed areas and the unexposed areas results, whereby a planographic printing plate is obtained which can be mounted on a printing machine and printed without any other treatments.

    摘要翻译: 平版印刷版材料,其包含支撑体和设置在所述载体上的感光层,所述感光层由(A)无机材料构成; (B)至少一种金属和/或金属化合物[(A)/(B))在施加电磁辐射时能够彼此反应]和(C)能够影响无机材料 A)和金属和/或金属化合物(B),其中无机材料(A),金属或金属化合物(B)和有机化合物(C)彼此接触。 当感光层暴露于电磁辐射时,导致曝光区域和未曝光区域的亲水或亲油性质的差异,由此得到平版印刷版,其可以安装在印刷机上并且没有任何其它印刷 治疗。