发明授权
- 专利标题: Light-sensitive film
- 专利标题(中): 感光膜
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申请号: US48740申请日: 1979-06-15
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公开(公告)号: US4289822A公开(公告)日: 1981-09-15
- 发明人: Toshikazu Shimada , Yoshifumi Katayama , Kiichi F. Komatsubara
- 申请人: Toshikazu Shimada , Yoshifumi Katayama , Kiichi F. Komatsubara
- 申请人地址: JPX Tokyo
- 专利权人: Hitachi, Ltd.
- 当前专利权人: Hitachi, Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX53/76457 19780626
- 主分类号: C01B31/36
- IPC分类号: C01B31/36 ; G03G5/043 ; G03G5/08 ; G03G5/082 ; H01L31/0248 ; H01L31/04 ; B32B7/12 ; B32B9/04
摘要:
A photoconductive material comprising an amorphous substance whose indispensable constituent elements are silicon, carbon and hydrogen is disclosed. The photoconductive material preferably has a structure expressed by [Si.sub.1-x C.sub.x ].sub.1-y [H].sub.y where 0.02.ltoreq.x.ltoreq.0.3 and 0.02.ltoreq.y.ltoreq.0.3. Up to 40% of the carbon can be substituted by germanium. The peak of response can be established for light of any desired wavelength between approximately 5,600 A-4,500 A. This photoconductive material is particularly useful when applied to a light-sensitive film which is operated in the storage mode. The light-sensitive film includes the photoconductive material in a region in which pairs of free electrons and positive holes are created upon incidence of light.
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