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US4364166A Semiconductor integrated circuit interconnections 失效
半导体集成电路互连

Semiconductor integrated circuit interconnections
Abstract:
An improved interconnection for semiconductor integrated circuits is provided by a member made of doped polycrystalline silicon and metal silicide that provides the simultaneous advantages of high conductivity and reduced overlap capacitance in multilayer integrated circuit devices. Such interconnecting members are useable to produce field effect transistor type devices.
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