发明授权
US4446218A Sulfur and/or amide-containing exposure accelerators for light-sensitive
coatings with diazonium compounds
失效
含有硫和/或酰胺的曝光促进剂用于具有重氮化合物的感光涂料
- 专利标题： Sulfur and/or amide-containing exposure accelerators for light-sensitive coatings with diazonium compounds
- 专利标题（中）： 含有硫和/或酰胺的曝光促进剂用于具有重氮化合物的感光涂料
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申请号： US359629申请日： 1982-03-18
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公开(公告)号： US4446218A公开(公告)日： 1984-05-01
- 发明人: Major S. Dhillon
- 申请人： Major S. Dhillon
- 申请人地址： NJ Somerville
- 专利权人： American Hoechst Corporation
- 当前专利权人： American Hoechst Corporation
- 当前专利权人地址： NJ Somerville
- 主分类号： G03F3/10
- IPC分类号： G03F3/10 ; G03F7/016 ; G03C1/58 ; G03C1/54 ; G03C1/60
摘要：
This invention relates to proof film-type light sensitive diazonium materials containing accelerators selected from sulfur and/or amide-containing compounds which are capable of accelerating the contact exposure of negative-working diazonium compounds when such diazonium compounds are subjected to UV radiation. These accelerators enhance essentially photosensitivity speed. The invention also relates to presensitized reproduction materials comprising diazonium materials containing these accelerators.
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