发明授权
- 专利标题: Silver halide photographic light-sensitive material
- 专利标题(中): 卤化银照相感光材料
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申请号: US411384申请日: 1982-08-25
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公开(公告)号: US4460680A公开(公告)日: 1984-07-17
- 发明人: Masashi Ogawa , Kunio Ishigaki , Nobuyuki Iwasaki , Taku Nakamura
- 申请人: Masashi Ogawa , Kunio Ishigaki , Nobuyuki Iwasaki , Taku Nakamura
- 申请人地址: JPX Minami-ashigara
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JPX Minami-ashigara
- 优先权: JPX56-132900 19810825
- 主分类号: G03C1/30
- IPC分类号: G03C1/30 ; C08F20/00 ; C08F20/10 ; C08F20/52 ; C08F28/00 ; C08F220/00 ; C08F220/04 ; C08F220/06 ; C08F220/38 ; C08F220/54 ; C08F226/02 ; G03C1/76
摘要:
A silver halide photographic light-sensitive material comprising a support having thereon at least one light-sensitive silver halide emulsion layer and a light-insensitive uppermost layer is disclosed. The light-insensitive uppermost layer has a melting time longer than that of the light-sensitive silver halide emulsion layer and the thickness of the light-insensitive uppermost layer is from 1.3 .mu.m to 5.0 .mu.m. The silver halide photographic light-sensitive material has an improved covering power and results in remarkably low degree of reticulation. Furthermore, when the material is used it results in a reduced amount of scum being formed in the processing solution.
公开/授权文献
- US5560034A Shared command list 公开/授权日:1996-09-24
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