发明授权
US4475037A Method of inspecting a mask using an electron beam vector scan system
失效
使用电子束矢量扫描系统检查掩模的方法
- 专利标题： Method of inspecting a mask using an electron beam vector scan system
- 专利标题（中）： 使用电子束矢量扫描系统检查掩模的方法
-
申请号： US377102申请日： 1982-05-11
-
公开(公告)号： US4475037A公开(公告)日： 1984-10-02
- 发明人: Peter Vettiger , Alan D. Wilson
- 申请人： Peter Vettiger , Alan D. Wilson
- 申请人地址： NY Armonk
- 专利权人： International Business Machines Corporation
- 当前专利权人： International Business Machines Corporation
- 当前专利权人地址： NY Armonk
- 主分类号： G01N21/88
- IPC分类号： G01N21/88 ; G01B15/00 ; G01N21/956 ; H01J37/304 ; H01L21/027 ; H01L21/66 ; G01N21/00 ; G01D18/00
摘要：
An electron beam fabricated mask used in the production of integrated circuits is tested by a method that includes the steps of forming a print of the mask and then inspecting the print by writing the same electron beam pattern or complement thereof on the print and detecting pattern coincidence and non-coincidence with a vector scan system.
公开/授权文献
信息查询
