发明授权
- 专利标题: High-temperature Hg anneal for HgCdTe
- 专利标题(中): HgCdTe的高温Hg退火
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申请号: US591903申请日: 1984-03-21
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公开(公告)号: US4481044A公开(公告)日: 1984-11-06
- 发明人: Herbert F. Schaake , John H. Tregilgas
- 申请人: Herbert F. Schaake , John H. Tregilgas
- 申请人地址: TX Dallas
- 专利权人: Texas Instruments Incorporated
- 当前专利权人: Texas Instruments Incorporated
- 当前专利权人地址: TX Dallas
- 主分类号: C22C1/00
- IPC分类号: C22C1/00 ; H01L21/477 ; C21D1/74
摘要:
The dislocation density near the surface of Hg.sub.1-x Cd.sub.x Te alloys is substantially reduced by annealing the material at around 600.degree. C. in a mercury saturated ambient for periods of four hours or more, prior to post annealing at lower temperatures to control the metal vacancy concentration. This procedure allows dislocation reduction by climb, reduces the concentration of metal vacancies which can collapse to form dislocation loops or contribute to dislocation multiplication, and reduces tellurium precipitates which contribute to dislocation multiplication during subsequent post annealing.
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