发明授权
- 专利标题： Enclosure for the treatment, and particularly for the etching of substrates by the reactive plasma method
- 专利标题（中）： 用于处理的外壳，特别是通过反应等离子体法蚀刻衬底
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申请号： US568099申请日： 1984-01-04
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公开(公告)号： US4491496A公开(公告)日： 1985-01-01
- 发明人: Philippe Laporte , Louise Peccoud
- 申请人： Philippe Laporte , Louise Peccoud
- 申请人地址： FRX Paris
- 专利权人： Commissariat a l'Energie Atomique
- 当前专利权人： Commissariat a l'Energie Atomique
- 当前专利权人地址： FRX Paris
- 优先权： FRX8300073 19830105
- 主分类号： C23C4/10
- IPC分类号： C23C4/10 ; C23C16/44 ; C23C16/509 ; H01J37/16 ; H01J37/32 ; H01L21/30 ; B44C1/22 ; C03C15/00 ; C23F1/00
摘要：
Enclosure for the treatment of substrates by the reactive plasma method, consisting in a known manner of an inlet and an outlet (12) for the circulation of a reactive gas at low pressure, a base supporting the substrate (10) to be treated being placed between two electrodes, one of which (3) is at the ground potential and the other (4) or radio-frequency electrode is brought to an alternative potential such as to create an electrical discharge in the enclosure. It is characterized in that the enclosure is metallic and lined by plasma torch spraying with a protective coating (2) of alumina (Al.sub.2 0.sub.3) of a thickness of about 300 micrometers.
公开/授权文献
- US5658865A Oxidation-inhibitive lubricating oil composition 公开/授权日：1997-08-19
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