发明授权
- 专利标题: Metal ion control agents based on dicyclopentadiene derivatives
- 专利标题(中): 基于二环戊二烯衍生物的金属离子控制剂
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申请号: US486122申请日: 1983-04-18
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公开(公告)号: US4500470A公开(公告)日: 1985-02-19
- 发明人: David A. Wilson
- 申请人: David A. Wilson
- 申请人地址: MI Midland
- 专利权人: The Dow Chemical Company
- 当前专利权人: The Dow Chemical Company
- 当前专利权人地址: MI Midland
- 主分类号: C02F5/12
- IPC分类号: C02F5/12 ; C02F5/14 ; C07C67/00 ; C07C213/00 ; C07C215/14 ; C07C301/00 ; C07C309/14 ; C07F9/38 ; C07F9/40 ; C07C143/21
摘要:
New compounds have been prepared from dicyclopentadiene bis(methylamine) which have the following formula ##STR1## wherein substituents A, B, X and Y each are independently selected from radicals including hydrogen, hydroxyalkyl (wherein the alkyl group contains 2-6 carbon atoms) phosphonic, sulfonic, hydroxyethyl- and hydroxypropyl-sulfonic, methylenephosphonic methylene-, ethylene- and propylenesulfonic, alkylcarboxylic acid radicals (having 2-4 carbon atoms) and the alkali or alkaline earth metal, ammonia and amine salts of any of the phosphonic, sulfonic or carboxylic acid derivatives. At least one of the substituents must be other than a hydrogen.
公开/授权文献
- US5770171A Process for production of chlorine dioxide 公开/授权日:1998-06-23
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