发明授权
- 专利标题: Method of manufacturing a radiation excited input phosphor screen
- 专利标题(中): 制造辐射激发输入荧光屏的方法
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申请号: US566227申请日: 1983-12-28
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公开(公告)号: US4528210A公开(公告)日: 1985-07-09
- 发明人: Takashi Noji , Norio Harao , Yoshiharu Obata
- 申请人: Takashi Noji , Norio Harao , Yoshiharu Obata
- 申请人地址: JPX Kawasaki
- 专利权人: Tokyo Shibaura Denki Kabushiki Kaisha
- 当前专利权人: Tokyo Shibaura Denki Kabushiki Kaisha
- 当前专利权人地址: JPX Kawasaki
- 优先权: JPX55-80146 19800616; JPX56-219341 19810217
- 主分类号: G21K4/00
- IPC分类号: G21K4/00 ; H01J29/38 ; B05D5/06 ; B05D5/12
摘要:
An input phosphor screen includes a substrate having a substantially smooth surface, and first and second phosphor layers both vapor-deposited sequentially on the substrate. The first layer is made of phosphor crystal particles having a mean diameter of 15 .mu.m or less. The second layer has a thickness ten or more times that of the first layer and is made of individual columnar crystals of alkali halide grown vertically on the crystal particles, standing close together with fine spaces therebetween. A third layer is preferably deposited on the second layer as a continuous film. These three layers can be deposited by evaporating a phosphor material or materials at a prescribed temperature and at a predetermined degree of vacuum.
公开/授权文献
- US5670210A Method of uniformly coating a substrate 公开/授权日:1997-09-23
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