发明授权
- 专利标题: Method for preventing deposition of polymer scale and a coating agent therefor
- 专利标题(中): 防止聚合物垢沉积的方法及其涂覆剂
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申请号: US601052申请日: 1984-04-16
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公开(公告)号: US4539230A公开(公告)日: 1985-09-03
- 发明人: Toshihide Shimizu , Ichiro Kaneko , Yoshiteru Shimakura
- 申请人: Toshihide Shimizu , Ichiro Kaneko , Yoshiteru Shimakura
- 申请人地址: JPX Tokyo
- 专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人: Shin-Etsu Chemical Co., Ltd.
- 当前专利权人地址: JPX Tokyo
- 优先权: JPX58-75557 19830428
- 主分类号: C08F2/00
- IPC分类号: C08F2/00 ; C09D1/00 ; B05D7/22
摘要:
The invention provides a method for preventing deposition of polymer scale on the reactor walls in the polymerization of an ethylenically unsaturated monomer, in particular, by emulsion polymerization. The method comprises coating the reactor walls with a coating composition containing, as the essential components, (A) an organic compound having at least 5 conjugated .pi. bonds in a molecule, (B) a chelating agent and (C) a metal compound capable of producing metal ions having a coordination number of at least 2 which presumably forms a metallic chelate compound with the chelating agent contributing to the formation of a strongly adsorbed layer on the reactor walls. The coating composition may be further admixed with a silicic acid compound such as a colloidal silica.
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