发明授权
- 专利标题: Method of forming thin vapor deposited film of organic material
- 专利标题(中): 形成有机材料薄蒸镀膜的方法
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申请号: US532817申请日: 1983-09-16
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公开(公告)号: US4543275A公开(公告)日: 1985-09-24
- 发明人: Goro Akashi , Akira Nahara , Yoshihiro Arai
- 申请人: Goro Akashi , Akira Nahara , Yoshihiro Arai
- 申请人地址: JPX Kanagawa
- 专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人: Fuji Photo Film Co., Ltd.
- 当前专利权人地址: JPX Kanagawa
- 优先权: JPX56-21651 19810216
- 主分类号: B05D1/28
- IPC分类号: B05D1/28 ; B05D7/24 ; C08J7/06 ; C23C14/12 ; C23C14/24 ; C23C14/56 ; G11B5/64 ; G11B5/72 ; G11B5/851
摘要:
A process for forming a vapor-deposited thin layer of organic material is disclosed. The process involves placing organic material on a support base within a vacuum chamber and providing a heat source in the vicinity of the organic material. A second support base is then provided within the vacuum chamber and heat is applied to the organic material at a temperature which causes the organic material to form vapors. The vapors are vapor-deposited on the second support base forming the thin layer of organic material. It is generally desirable to move both of the support bases during the vapor deposition process allowing the formation of a continuous uniform thin layer of organic material.
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