发明授权
US4559292A Photosensitive transfer material having a support of defined roughness
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感光转印材料具有规定的粗糙度的支撑
- 专利标题： Photosensitive transfer material having a support of defined roughness
- 专利标题（中）： 感光转印材料具有规定的粗糙度的支撑
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申请号： US537000申请日： 1983-09-29
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公开(公告)号： US4559292A公开(公告)日： 1985-12-17
- 发明人: Ulrich Geissler , Walter Herwig , Helga Sikora
- 申请人： Ulrich Geissler , Walter Herwig , Helga Sikora
- 申请人地址： DEX Frankfurt am Main
- 专利权人： Hoechst Aktiengesellschaft
- 当前专利权人： Hoechst Aktiengesellschaft
- 当前专利权人地址： DEX Frankfurt am Main
- 优先权： DEX3236560 19831002
- 主分类号： G03F7/004
- IPC分类号： G03F7/004 ; G03C1/76 ; G03C1/805 ; G03F7/09 ; G03F7/115 ; G03F7/34 ; G03C3/00
摘要：
The present invention relates to a photosensitive transfer material, which comprises a flexible temporary support film which is preferably transparent, a thermoplastic photosensitive layer, optionally a flexible cover film on the free side of the photosensitive layer and, optionally, an intermediate layer between the support film and the photosensitive layer. The photosensitive transfer material is suitable for manufacturing photoresist stencils and solder masks. The temporary support film has a rough surface which exerts an embossing effect on the surface of the photosensitive layer and the intermediate layer, respectively. The mat-finish of the intermediate layer prevents an irregular deformation of this layer in moist air, while the mat-finish of the photosensitive layer precludes unwanted reflections.
公开/授权文献
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